Real-time studies of nucleation and interface formation in microcrystalline silicon growth

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn C, Issue , 2003, Pages 2761-2766

  Fujiwara, Hiroyuki ^a   Kondo, Michio ^a   Matsuda, Akihisa ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATED TOTAL REFLECTANCE (ATR) SPECTROSCOPY; INTERFACE FORMATION; MICROCRYSTALLINE SILICON; SPECTROSCOPIC ELLIPSOMETRY (SE);

CRYSTALLINE MATERIALS; ELLIPSOMETRY; GROWTH (MATERIALS); INTERFACES (MATERIALS); MAGNETRON SPUTTERING; NITROGEN OXIDES; NUCLEATION; POROUS MATERIALS; REAL TIME SYSTEMS; SPECTROSCOPIC ANALYSIS; STRESS ANALYSIS;

SEMICONDUCTING SILICON;

EID: 6444226795     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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