Photocrosslinkable copolymers based on 4-acryloyloxyphenyl-3'-chlorostyryl ketone and methyl methacrylate: Synthesis, comonomer reactivity ratios and UV photosensitivity

Polymer International

Volumn 53, Issue 11, 2004, Pages 1735-1743

  Balaji, R ^a,b   Grande, D ^a   Nanjundan, S ^b  

^a CNRS Université Paris Est Créteil Val de Marne   (France)

^b ANNA UNIVERSITY   (India)

Author keywords

Cinnamoyl moiety; Copolymerization; Methyl methacrylate; Negative photoresist; Reactivity ratios; UV photocrosslinking

Indexed keywords

COMPOSITION; CROSSLINKING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MONOMERS; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOCHEMICAL REACTIONS; SIZE EXCLUSION CHROMATOGRAPHY; SOLVENTS; SYNTHESIS (CHEMICAL); THIN FILMS; ULTRAVIOLET RADIATION;

ERROR-IN-VARIABLES MODEL METHOD (EVM); PHOTOREACTIVE COPOLYMERS;

COPOLYMERS;

POLYMER SCIENCE;

EID: 6444221346     PISSN: 09598103     EISSN: None     Source Type: Journal    
DOI: 10.1002/pi.1550     Document Type: Article

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