Poly(3-hexylthiophene)/ZnO hybrid pn junctions for microelectronics applications

Applied Physics Letters

Volumn 94, Issue 14, 2009, Pages

  Katsia, E ^a   Huby, N ^a   Tallarida, G ^a   Kutrzeba Kotowska, B ^a   Perego, M ^a   Ferrari, S ^a   Krebs, F C ^b   Guziewicz, E ^c   Godlewski, M ^c   Osinniy, V ^c   Luka, G ^c  

^a LABORATORIO MDM   (Italy)

^b TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^c INSTITUTE OF PHYSICS   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; HETEROJUNCTIONS; II-VI SEMICONDUCTORS; MICROELECTRONICS; TEMPERATURE; ZINC OXIDE;

ELECTRICAL CHARACTERISTIC; ENERGY-BAND DIAGRAM; LOW TEMPERATURES; P-N JUNCTION; POLY (3-HEXYLTHIOPHENE); RECTIFICATION RATIO;

ELECTRIC RECTIFIERS;

EID: 64349113183     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3114442     Document Type: Article

References (23)

1. C. H. Chen and I. Shih, J. Mater. Sci.: Mater. Electron. JSMEEV 0957-4522 10.1007/s10854-006-9038-y 17, 1047 (2006).
2. C. R. Kagan, D. B. Mitzi, and C. D. Dimitrakopoulos, Science SCIEAS 0036-8075 10.1126/science.286.5441.945 286, 945 (1999).
3. N. Tessler, M. Medvedev, M. Kazes, S. Kan, and U. Banin, Science SCIEAS 0036-8075 10.1126/science.1068153 295, 1506 (2002).
4. M. -J. Lee, S. Seo, D. -C. Kim, S. -E. Ahn, D. H. Seo, I. -K. Yoo, I. -G. Baek, D. -S. Kim, I. -S. Byun, S. -H. Kim, I. -R. Hwang, J. -S. Kim, S. -H. Jeon, and B. H. Park, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200601025 19, 73 (2007).
5. M. -J. Lee, Y. Park, B. -S. Kang, S. -E. Ahn, C. Lee, K. Kim, W. Xianyu, G. Stefanovich, J. -H. Lee, S. -J. Chung, Y. -H. Kim, C. -S. Lee, J. -B. Park, I. -G. Baek, and I. -K. Yoo, Tech. Dig.-Int. Electron Devices Meet. TDIMD5 0163-1918 2007, 771.
6. Ü. Özgür, Ya. I. Alivov, C. Liu, A. Teke, M. A. Reshchikov, S. Doǧan, V. Avrutin, S. -J. Cho, and H. Morko̧, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1992666 98, 041301 (2005).
7. S. T. Tan, X. W. Sun, Z. G. Yu, P. Wu, G. Q. Lo, and D. L. Kwong, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2768917 91, 072101 (2007).
8. R. Ding, H. Zhu, and Q. Zeng, Vacuum 82, 510 (2008). 0042-207X
9. B. N. Pal, J. Sun, B. J. Jung, E. Choi, A. G. Andreou, and H. E. Katz, Adv. Mater. (Weinheim, Ger.) ADVMEW 0935-9648 10.1002/adma.200701550 20, 1023 (2008).
10. S. Mridha and D. Basak, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2898399 92, 142111 (2008).
11. N. Huby, S. Ferrari, E. Guziewicz, M. Godlewski, and V. Osinniy, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2830940 92, 023502 (2008).
12. L. Niinistö, J. Päiväsaari, J. Niinistö, M. Putkonen, and M. Nieminen, Phys. Status Solidi A PSSABA 0031-8965 10.1002/pssa.200406798 201, 1443 (2004).
13. H. Sirringhaus, N. Tessler, and R. H. Friend, Science SCIEAS 0036-8075 10.1126/science.280.5370.1741 280, 1741 (1998).
14. H. Sirringhaus, P. J. Brown, R. H. Friend, M. M. Nielsen, K. Bechgaard, B. M. W. Langeveld-Voss, A. J. H. Spiering, R. A. J. Janssen, E. W. Meijer, P. Herwig, and D. M. de Leeuw, Nature (London) NATUAS 0028-0836 10.1038/44359 401, 685 (1999).
15. W. U. Huynh, J. J. Ditmtmer, and A. P. Alivisatos, Science SCIEAS 0036-8075 10.1126/science.1069156 295, 2425 (2002).
16. E. Katsia, G. Tallarida, B. Kutrzeba-Kotowska, S. Ferrari, E. Bundgaard, R. Søndergaard, and F. C. Krebs, Org. Electron. 9, 1044 (2008). 1566-1199
17. A. Kowalik, E. Guziewicz, K. Kopalko, S. Yatsunenko, M. Godlewski, and A. Wojcik, Acta Phys. Pol. A ATPLB6 0587-4246 112, 401 (2007).
18. N. Huby, G. Tallarida, M. Kutrzeba, S. Ferrari, E. Guziewicz,. Wachnicki, and M. Godlewski, Microelectron. Eng. MIENEF 0167-9317 10.1016/j.mee.2008.07. 016 85, 2442 (2008).
19. C. H. Lei, A. Das, M. Elliott, J. E. Macdonald, and M. L. Turner, Synth. Met. SYMEDZ 0379-6779 10.1016/j.synthmet.2004.05.003 145, 217 (2004).
20. S. A. Choulis, Y. Kim, J. Nelson, D. D. C. Bradley, M. Giles, M. Shkunov, and I. McCulloch, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1805175 85, 3890 (2004).
21. E. J. Meijer, D. M. De Leeuw, S. Setayesh, E. Van Veenendaal, B. -H. Huisman, P. W. M. Blom, J. C. Hummelen, U. Scherf, and T. M. Klapwijk, Nature Mater. NMAACR 1476-1122 10.1038/nmat978 2, 678 (2003).
22. S. Cho, K. Lee, J. Yuen, G. Wang, D. Moses, A. J. Heeger, M. Surin, and R. Lazzaroni, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2400796 100, 114503 (2006).
23. Q. L. Gu, C. C. Ling, X. D. Chen, C. K. Cheng, A. M. C. Ng, C. D. Beling, S. Fung, G. Brauer, and H. C. Ong, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2715025 90, 122101 (2007).