Combined model for growing mechanism of carbon nanotubes using HFCVD: effect of temperature and molecule gas diffusion

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3562-3565

  Hong, Nguyen Tuan ^a   Koh, Ken Ha ^a   Tam, Ngo Thi Thanh ^b   Minh, Phan Ngoc ^b   Khoi, Phan Hong ^b   Lee, Soonil ^a  

^a Ajou University   (South Korea)

^b INSTITUTE OF MATERIALS SCIENCE   (Viet Nam)

Author keywords

Carbon nanotube (CNT); Hot filament chemical vapor deposition (HFCVD); Vertically aligned CNT growth

Indexed keywords

COMBINED MODELS; EFFECT OF TEMPERATURES; GAS DIFFUSIONS; GROWTH MECHANISMS; GROWTH STAGES; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); PRECURSOR DIFFUSIONS; TEMPORAL VARIATIONS; THERMODYNAMIC MODELS; VERTICALLY-ALIGNED CNT GROWTH;

CATALYST DEACTIVATION; CATALYST POISONING; CHEMICAL VAPOR DEPOSITION; DIFFUSION; FILAMENTS (LAMP); THERMAL EFFECTS; VAPORS;

CARBON NANOTUBES;

EID: 64349099567     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.066     Document Type: Article

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