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Volumn 517, Issue 12, 2009, Pages 3559-3561

HFCVD of diamond and its application as electrode in aluminum electrolysis

Author keywords

Boron doped diamond film; Hot filament chemical vapor deposition; Low temperature aluminum electrolysis; Silicon wafer

Indexed keywords

ALUMINUM PRODUCTIONS; BORON-DOPED-DIAMOND FILM; DIAMOND COATINGS; DIAMOND ELECTRODES; DIAMOND THIN FILMS; ELECTROCHEMISTS; GRAPHITE ANODES; GREEN PROCESS; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; INERT ANODES; LOW TEMPERATURE ALUMINUM ELECTROLYSIS; OXYGEN EVOLUTIONS; RESEARCH TOPICS; SILICON SUBSTRATES; THIN LAYERS;

EID: 64349095033     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.035     Document Type: Article
Times cited : (7)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.