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Volumn 517, Issue 12, 2009, Pages 3559-3561
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HFCVD of diamond and its application as electrode in aluminum electrolysis
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Author keywords
Boron doped diamond film; Hot filament chemical vapor deposition; Low temperature aluminum electrolysis; Silicon wafer
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Indexed keywords
ALUMINUM PRODUCTIONS;
BORON-DOPED-DIAMOND FILM;
DIAMOND COATINGS;
DIAMOND ELECTRODES;
DIAMOND THIN FILMS;
ELECTROCHEMISTS;
GRAPHITE ANODES;
GREEN PROCESS;
HOT-FILAMENT CHEMICAL VAPOR DEPOSITION;
INERT ANODES;
LOW TEMPERATURE ALUMINUM ELECTROLYSIS;
OXYGEN EVOLUTIONS;
RESEARCH TOPICS;
SILICON SUBSTRATES;
THIN LAYERS;
ALUMINA;
ALUMINUM;
BORON;
CHEMICAL VAPOR DEPOSITION;
DIAMOND CUTTING TOOLS;
DIAMOND FILMS;
DIAMONDS;
ELECTROCHEMICAL ELECTRODES;
ELECTROCHEMISTRY;
FILAMENTS (LAMP);
GRAPHITE;
OXYGEN;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
THIN FILMS;
VAPORS;
ELECTROLYSIS;
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EID: 64349095033
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2009.01.035 Document Type: Article |
Times cited : (7)
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References (12)
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