Photocatalytic degradation of amorphous TiO2-V films grown by magnetron sputtering

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology

Volumn 29, Issue 2, 2009, Pages 209-212

  Huang, Jiamu ^a   Cai, Xiaoping ^a   Zhao, Pei ^a   Li, Yuexia ^a  

^a CHONGQING UNIVERSITY   (China)

Author keywords

Amorphous TiO2 V films; Magnetron sputtering; Methylene blue; Photocatalysis

Indexed keywords

AMORPHOUS TIO2-V FILMS; FILMS THICKNESS; GROWTH CONDITIONS; METHYLENE BLUE; PHOTO DEGRADATIONS; PHOTO-CATALYTIC DEGRADATIONS; RF-POWER; SILICON SUBSTRATES; SUBSTRATE TEMPERATURES; VANADIUM-DOPED TITANIUM DIOXIDES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

DEGRADATION; FILM GROWTH; MAGNETIC FILMS; MAGNETRON SPUTTERING; MAGNETRONS; MOLECULAR BEAM EPITAXY; PHOTOCATALYSIS; PHOTODEGRADATION; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; TITANIUM; TITANIUM DIOXIDE; VANADIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 64249084010     PISSN: 16727126     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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