Epitaxial thin films of (Bi0.9La0.1)2NiMnO6 obtained by pulsed laser deposition

Journal of Magnetism and Magnetic Materials

Volumn 321, Issue 11, 2009, Pages 1748-1753

  Langenberg, E ^a,b   Varela, M ^a,b   Garcia Cuenca M V ^a,b   Ferrater, C ^a,b   Polo, M C ^a,b   Fina, I ^c   Fabrega L ^c   Sanchez F ^c   Fontcuberta, J ^c  

^a UNIVERSITY OF BARCELONA   (Spain)

^b UNIVERSITY OF BARCELONA   (Spain)

^c INSTITUT DE CIÈNCIA DE MATERIALS DE BARCELONA ICMAB CSIC   (Spain)

Author keywords

Bi based double perovskite; Multiferroic; Thin film growth

Indexed keywords

BI-BASED DOUBLE PEROVSKITE; DEPOSITION CONDITIONS; EPITAXIAL THIN FILMS; LONG-RANGE ORDERINGS; MAGNETISATION; MULTIFERROIC; OXYGEN PRESSURE RANGES; OXYGEN PRESSURES; PULSED LASERS; SUBSTRATE TEMPERATURES; SYSTEMATIC STUDIES; TEMPERATURE WINDOWS; THEORETICAL VALUES; THIN FILM GROWTH; UNIT CELLS;

EPITAXIAL FILMS; FERROMAGNETIC MATERIALS; FERROMAGNETISM; LANTHANUM; MANGANESE; MANGANESE COMPOUNDS; MOLECULAR BEAM EPITAXY; OXIDE MINERALS; OXYGEN; PEROVSKITE; PULSED LASER DEPOSITION; SUBSTRATES; THIN FILM DEVICES;

FILM GROWTH;

EID: 64149108905     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2009.02.005     Document Type: Article

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