A radical approach to promote multiferroic coupling in double perovskites

Journal of Magnetism and Magnetic Materials

Volumn 321, Issue 11, 2009, Pages 1743-1747

  Singh, M P ^a   Truong, K D ^a   Fournier, P ^a   Rauwel, P ^b   Rauwel, E ^b   Carignan, L P ^c   Menard D ^c  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

^b UNIVERSITY OF AVEIRO   (Portugal)

^c ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Double perovskite; Multiferroics; Property; Structure; Thin film

Indexed keywords

DESIGN MATERIALS; DOUBLE PEROVSKITE; EPITAXIAL THIN FILMS; FUNCTIONAL PROPERTIES; GROWTH CONDITIONS; MAGNETIC INSULATORS; MAGNETIC ORDERINGS; MULTIFERROIC; MULTIFERROICS; OXIDE SYSTEMS; POLARIZATION FIELDS; PROPERTY; PULSED LASERS; SELF ORDERINGS; STRONG COUPLINGS; STRUCTURAL CHARACTERISTICS; STRUCTURAL EFFECTS; STRUCTURE; TRANSITION TEMPERATURES;

CURIE TEMPERATURE; EPITAXIAL FILMS; FERROMAGNETISM; GROWTH (MATERIALS); LANTHANUM; OXIDE MINERALS; PEROVSKITE; POSITIVE IONS; PULSED LASER DEPOSITION; THIN FILM DEVICES;

FILMS;

EID: 64149105507     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2009.02.003     Document Type: Article

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