Plasma gradient controlled injection and postacceleration of high quality electron bunches

AIP Conference Proceedings

Volumn 1086, Issue , 2009, Pages 12-20

  Geddes, C G R ^a   Cormier Michel, E ^a   Esarey, E ^a,b   Nakamura, K ^a   Plateau, G R ^a,c   Schroeder, C B ^a   Toth, Cs ^a   Bruhwiler, D L ^d   Cary, J R ^d,e   Leemans, W P ^a,f,g  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b U NV Reno   (United States)

^c ECOLE POLYTECHNIQUE   (France)

^d TECH X CORPORATION   (United States)

^e U CO Boulder   (United States)

^f UNIVERSITY OF NEVADA   (United States)

^g UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Laser wakefield acceleration; Particle in cell simulation; Plasma gradient controlled injection

Indexed keywords

EID: 63849148826     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3080892     Document Type: Conference Paper

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