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Electrochimica Acta

Volumn 54, Issue 13, 2009, Pages 3645-3650

The transpassive dissolution mechanism of 316L stainless steel

(4) Fattah alhosseini, A a Saatchi, A a Golozar, M A a Raeissi, K a

a ISFAHAN UNIVERSITY OF TECHNOLOGY (Iran)

Author keywords

Electrochemical impedance spectroscopy; Kinetic model; Point defect model; Stainless steel; Transpassive dissolution

Indexed keywords

CHROMIUM; CHROMIUM COMPOUNDS; DEFECTS; DISSOLUTION; ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; FILM GROWTH; IRON COMPOUNDS; KINETIC THEORY; METAL ANALYSIS; OXYGEN; OXYGEN VACANCIES; PASSIVATION; POINT DEFECTS; SEMICONDUCTOR GROWTH; SEMICONDUCTOR MATERIALS; STEEL METALLURGY; SURFACE DEFECTS;

316 L STAINLESS STEELS; AISI 316; ELECTROCHEMICAL-IMPEDANCE SPECTROSCOPIES; FILM GROWTH RATES; GENERALIZED MODELS; KINETIC MODEL; N-TYPE SEMICONDUCTORS; NEGATIVE SURFACE CHARGES; NON STATIONARIES; P-TYPE SEMICONDUCTORS; PARALLEL REACTIONS; POINT DEFECT MODEL; TRANSPASSIVE DISSOLUTION; TRANSPASSIVITY;

STAINLESS STEEL;

EID: 63649141264 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/j.electacta.2009.01.040 Document Type: Article

Times cited : (93)

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