Ferroelectric lithography: Bottom-up assembly and electrical performance of a single metallic nanowire

Nano Letters

Volumn 9, Issue 2, 2009, Pages 763-768

  Haussmann, Alexander ^a   Milde, Peter ^a   Erler, Christiane ^b   Eng, Lukas M ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b Max Bergmann Zentrum fur Biomaterialien   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGES; DYNAMIC SCANNING; ELECTRICAL PERFORMANCE; ELECTRICAL TRANSPORTS; ELEMENTAL METALS; IONIC SOLUTIONS; KELVIN PROBE FORCE MICROSCOPIES; METAL NANOWIRES; METALLIC NANOWIRES; OHMIC BEHAVIORS; PERFORMANCE TESTING; PHOTOCHEMICAL REDUCTIONS;

DOMAIN WALLS; ELECTRIC WIRE; FERROELECTRICITY; METAL TESTING; NANOWIRES; PRECIOUS METALS; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS;

CURRENT VOLTAGE CHARACTERISTICS;

IRON; NANOWIRE;

ARTICLE; CHEMISTRY; ELECTRON; ELECTRON MICROSCOPY; ULTRASTRUCTURE;

ELECTRONS; IRON; MICROSCOPY, ELECTRON; NANOWIRES;

EID: 63649093548     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/n18033784     Document Type: Article

References (15)

1. Korneva, G.; Haihui, Y.; Gogotsi, Y.; Halverson, D.; Friedman, G.; Bradley, J.-C.; Kornev. K. G. Nano Lett. 2005, 5, 879.
2. Stampfer, C.; Schurtenberger, E.; Molitor, F.; Güttinger, J.; Ihn, T.; Ensslin, K. Nano Lett. 2008, 8, 2378.
3. Härtling, T.; Alaverdyan, Y.; Wenzel, M. T.; Kullock, R.; Käll, M.; Eng, L. M. J. Phys. Chem. C 2008, 112, 4920.
4. Law, M.; Goldberger, J.; Yang, P. Ann. Rev. Mater. Res. 2004, 34, 83.
5. Jung, T. A.; Schlittler, R. R.; Gimzewski, J. K.; Tang, H.; Joachim, C. Science 1996, 271, 181.
6. Giocondi, J. L.; Rohrer, G. S. J. Phys. Chem. B 2001, 105, 8275.
7. Kalinin, S. V.; Bonnell, D. A.; Alvarez, T.; Lei, X.; Hu, Z.; Ferris, J. H.; Zhang, Q.; Dunn, S. Nano Lett. 2002, 2, 589.
8. Dunn, S.; Cullen, D.; Abad-Garcia, E.; Bertoni, C.; Carter, R.; Howorth, D.; Whatmore, R. W. Appl. Phys. Lett. 2004, 85, 3537.
9. Hanson, J. N.; Rodriguez, B. J.; Nemanich, R. J.; Gruverman, A. Nanotechnology 2006, 17, 4946.
10. Müller, M.; Soergel, E.; Buse, K. Appl. Phys. Lett. 2003, 83, 1824.
11. Wengler, M. C.; Heinemeyer, U.; Soergel, E.; Buse, K. J. Appl. Phys. 2005, 98, 064104.
12. Abplanalp, M.; Eng, L. M.; Gunter, P. Appl. Phys. A 1998, 66, 231.
13. Dunn, S.; Tiwari, D.; Jones, P. M.; Gallardo, D. E. .J. Mater. Chem. 2007, 17, 4460.
14. Dunn, S.; Tiwari, D. Appl. Phys. Lett. 2008, 93, 092905.
15. Zerweck, U.; Loppacher, C.; Otto, T.; Grafstrom, S.; Eng, L. M. Phys. Rev. B 2005, 71, 125424.