Dopant analysis on advanced CMOS technologies

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 2008, Pages 505-509

  Siegelin, Frank ^a   Dübotzky, Anja ^a   Danzfuss, Bodo ^a   Schömann, Stephan ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED CMOS; CHEMICAL ETCHINGS; CROSS SECTIONS; NANO-SIMS; SCANNING SPREADING RESISTANCE MICROSCOPIES; TEM;

QUALITY ASSURANCE; SAFETY FACTOR; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICES; TRANSMISSION ELECTRON MICROSCOPY;

FAILURE ANALYSIS;

EID: 63549115780     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1361/cp2008istfa505     Document Type: Conference Paper

References (7)

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