Modeling of focused ion beam trimming of cantilever beams

2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000

Volumn , Issue , 2000, Pages 79-82

  Lam, Tai ^a   Darling, Robert B ^a  

^a University of Washington   (United States)

Author keywords

Cantilever beams; Finite element method; Focused ion beam trimming

Indexed keywords

ALGORITHMS; APPROXIMATION THEORY; CANTILEVER BEAMS; COMPUTER SIMULATION; ELECTRIC POTENTIAL; FINITE ELEMENT METHOD; SCANNING ELECTRON MICROSCOPY; THICKNESS CONTROL; TRIMMING;

BIAS VOLTAGE; FOCUSED ION BEAM TRIMMING; NON-UNIFORM THICKNESS; SNAP-DOWN VOLTAGE;

ION BEAMS;

EID: 6344287849     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. J. Melngailis, C. R. Musil, E. H. Stevens, M. Utlaut, E. M. Kellogg, R. T. Post, M. W. Geis, and R. W. Mountain, "The Focused Ion Beam as an Integrated Circuit Restructuring Tool," J. Vac. Sci. Tech. B, vol. 4, no. 1, pp. 176-180, Jan./Feb. 1986.
2. B. Jensen, M. de Boer, and S. Miller, "IMAP: Interferometry for Material Property Measurement in MEMS", Proc. 1999 MSM Conf., pp. 206-209, San Juan, Puerto Rico, Apr. 19-21, 1999.
3. Steven M. Lepi, Practical Guide to Finite Elements: A Solid Mechanics Approach. New York: Marcel Dekker, Inc., 1998.