Nitrogen irradiation of Fe/Si bilayers: Nitride versus suicide phase formation

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 8, 2004, Pages 2093-2097

  Milinovic, V ^a   Bibic, N ^a,b   Dhar, S ^c   Siljegovic, M ^b   Schaaf, P ^a   Lieb, K P ^a  

^a UNIVERSITY OF GÖTTINGEN   (Germany)

^b UNIVERSITY OF BELGRADE   (Serbia)

^c Bldg 142   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ION IMPLANTATION; MOLECULAR DYNAMICS; MULTILAYERS; NITROGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; THIN FILMS; X RAY DIFFRACTION;

DEIONIZED WATER; ION CHARGES; THERMAL SPIKE;

IRON;

EID: 6344287315     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2889-2     Document Type: Article

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