Optimised operation of gas field ion source

Applied Physics A: Materials Science and Processing

Volumn 79, Issue 8, 2004, Pages 1901-1905

  Kalbitzer, S ^a  

^a Ion Beam Technology Consulting   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; DESORPTION; ELECTRIC FIELDS; FUNCTIONS; GEOMETRY; HYDROGEN; INTEGRATED CIRCUITS; ION BEAMS; IONIZATION; OPTIMIZATION; PROBABILITY;

BEST IMAGE FIELD (BIF); FIELD ION MICROSCOPY (FIM); GAS FIELD; SURFACE DIFFUSION;

ION SOURCES;

EID: 6344265169     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2869-6     Document Type: Article

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4. M. Drechsler, F. Henkel: Z. Phys. 6, 22 (1954)
5. W.P. Dyke, W.W. Dolan: in Advances in Electronics and Electron Physics, Vol. 8, ed. by L. Marton (Academic, New York 1956) p. 89
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7. T.T. Tsong: in Atom-probe field ion microscopy (Cambridge University Press, Cambridge 1990) Chap. 2.1.4, p. 19
8. R. Gomer: in Field Emission and Field Ionization (Harvard University Press, Cambridge, MA 1961) Chap. 4, p. 134