Closed chamber PCR-chips for DNA amplification

IEE Colloquium (Digest)

Volumn , Issue 32, 2000, Pages 17-21

  Schabmueller, C G J ^a   Evans, A G R ^a   Brunnschweiler, A ^a   Ensell, G J ^a   Leslie, D L ^b   Lee, M A ^b  

^a UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^b DEFENCE SCIENCE AND TECHNOLOGY LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC BONDING; POLYMERASE CHAIN REACTIONS (PCR); SILICON CHIPS; TEMPERATURE SENSORS;

ANODES; DNA; ETCHING; MICROMACHINING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SENSORS; SILICON WAFERS;

SILICON;

EID: 6344255245     PISSN: 09633308     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (9)

1. H. A. Erlich [ed.], "PCR Technology - Principles and Applications for DNA Amplification", Stockton Press, 1989.
2. M. A. Northrup, M. T. Ching, R. M. White, R. T. Watson, "DNA Amplification with a Microfabricated Reaction Chamber", Proc. Transducers '93, Chicago, USA, pp. 924-926, 1993.
3. P. Belgrader et al., "Multi-chamber, Real Time DNA Analysis in the Field using Microfabricated Silicon Chambers", ASME 1998, DSC-Vol. 66, pp. 279-283, 1998.
4. J. H. Daniel, S. Iqbal, R. B. Millington, D. F. Moore, C. R. Lowe, D. L. Leslie, M. A. Lee, M. J. Pearce, "Silicon microchambers for DNA amplification", Sensors and Actuators A, Vol. 71, No. 1-2, pp. 81-88, 1998.
5. M. Kopp, A. Mello, A. Manz, SCIENCE, Vol. 280, 1998.
6. nd International Conference on Microreaction Technology, New Orleans, USA, pp. 241-247, 1998.
7. M. Richter, P. Woias, D. Weiss, "Microchannels for applications in liquid dosing and flow-rate measurement", Sensors and Actuators A, Vol. 62, pp. 480-483, 1997.
8. G. K. Mayer, H. L. Offereins, H. Sandmaier, K. Kuehl, "Fabrication of Non-Underetched Convex Corners in Anisotropic Etching of (100)-Silicon in Aqueous KOH with Respect to Novel Micromechanic Elements", J. Electrochem. Soc., Vol. 137, No. 12, pp. 3947-3951, 1990.
9. H. Sandmaier, H. L. Offereins, K. Kuehl, W. Lang, "Corner Compensation Techniques in Anisotropic Etching of (100)-Silicon Using Aqueous KOH", Proc. Transducers '91, pp. 456-459, 1991.