First hot-wire deposited triple junction silicon thin film solar cell

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1847-1848

  Schropp, R E I ^a   Adams, J ^a   Bink, A ^a   Bronsveld, P C P ^a   Francke, J ^a   Franken, R H J ^a   Goldbach, H D ^a   Gordijn, A ^a   Zambrano, R J Jimenez ^a   Li, H ^a   Lof, R W ^a   Loffler J ^a   Van Der Mark, G ^a   Rath, J K ^a   Rusche, M ^a   Stolk, R L ^a   Van Veen, M K ^a   Van Der Werf, C H M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON THIN FILMS; SPECTRUM SPLITTING; TANDEM CELLS; TRIPLE JUNCTIONS;

CHEMICAL VAPOR DEPOSITION; COSTS; CRYSTALLINE MATERIALS; PHOTOVOLTAIC CELLS; SEMICONDUCTOR JUNCTIONS; SPECTRUM ANALYSIS; THIN FILMS; WIRE;

SOLAR CELLS;

EID: 6344249186     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)

1. K. Ishibashi, M. Karasawa, G. Xu, N. Yokokawa, M. Ikemoto, A. Matsuda, and H. Matsumura, Thin Solid Films 430/1-2 (2003) 58.
2. R.E.I. Schropp, C.H.M. van der Werf, M.K. van Veen, P.A.T.T. van Veenendaal, R. Jimenez Zambrano, Z. Hartman, J. Löffler, and J.K. Rath, Materials Research Society Symposia Proceedings 664 (2001) A15.6.1.
3. nd International Conference on Cat-CVD (Hot Wire CVD) Process (Denver, USA, Sept. 2002), Thin Solid Films 430/1-2 (2003) 216.