Performance characterization of thin AIN films deposited on mo electrode for thin-film bulk acoustic-wave resonators

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 8 A, 2004, Pages 5510-5515

  Tay, Kok Wan ^a   Huang, Cheng Liang ^a   Wu, Long ^b   Lin, Meng Shan ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b F tech Corporation   (Taiwan)

Author keywords

c axis orientation; FBAR; Molybdenum; Surface roughness; Thin AlN film

Indexed keywords

ATOMIC FORCE MICROSCOPY; CERAMIC MATERIALS; ELECTRODES; MICROWAVES; MOLYBDENUM; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; PIEZOELECTRIC MATERIALS; RESONATORS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

FILM BULK ACOUSTIC-WAVE RESONATORS (FBAR); LOW DIELECTRIC LOSS; SURFACE ACOUSTIC WAVE (SAW); THIN ALN FILM;

THIN FILMS;

EID: 6344249050     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5510     Document Type: Article

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