Robust ion-implantation process design through statistical analysis

2000 International Conference on Modeling and Simulation of Microsystems - MSM 2000

Volumn , Issue , 2000, Pages 40-43

  Sudhama, C ^a   Thoma, Rainer ^a   Morris, Mike F ^a   Christiansen, Jim ^a   Lim, Ik Sung ^a  

^a MOTOROLA INC   (United States)

Author keywords

Angle; Ion implantation; Process design; Statistical process error; Tilt

Indexed keywords

CALIBRATION; COMPUTER SIMULATION; ERROR ANALYSIS; PROCESS CONTROL; ROBUSTNESS (CONTROL SYSTEMS); STATISTICAL METHODS; VARIATIONAL TECHNIQUES; WSI CIRCUITS;

ANGLE; PROCESS-DESIGN; STATISTICAL-PROCESS-ERROR; TILT;

ION IMPLANTATION;

EID: 6344228590     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. S. Morris, et al, IEEE-IEDM Technical Digest, p. 721-724, 1996.
2. G. Hobler, et al, IEEE-IEDM Technical Digest, p. 489-492, 1997.
3. UT-MARLOWE manual, University of Texas at Austin and Los Alamos National Labs.
4. Data from MEMC Electronic Materials, Inc.
5. J.N. Kapur & H.K. Kesavan, "Entropy Optimization Principles with Applications," Academic Press, p.62, 1992.
6. Athanasios Papoulis, "Probability, Random Variables, and Stochastic Processes," McGraw-Hill, 1984.