Pulsed-laser deposition of LiNbO3 in low gas pressure using pure ozone

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 8 A, 2004, Pages 5307-5312

  Tsukada, Ichiro ^a   Higuchi, Sadao ^a  

^a CENTRAL RESEARCH INSTITUTE OF ELECTRIC POWER INDUSTRY   (Japan)

Author keywords

AFM; LiNbO3; Ozone; PLD

Indexed keywords

EVAPORATION; HIGH TEMPERATURE EFFECTS; MOLECULAR BEAM EPITAXY; OZONE; PARAMETER ESTIMATION; PULSED LASER DEPOSITION; SINGLE CRYSTALS; STOICHIOMETRY; SUBSTRATES; SUPERLATTICES; SURFACE ROUGHNESS; THIN FILMS; VACUUM; X RAY DIFFRACTION;

FLUX DENSITY; GAS FLUX; LOW GAS PRESSURE; LOW PRESSURE GROWTH;

LITHIUM NIOBATE;

EID: 6344219894     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5307     Document Type: Article

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