Studies on the surface reactions of substituted disilanes with silica surface

Materials Research Society Symposium Proceedings

Volumn 1066, Issue , 2008, Pages 131-136

  Blomberg, Tom ^a   Matero, Raija ^a   Haukka, Suvi ^a   Root, Andrew ^b  

^a ASM Microchemistry Oy   (Finland)

^b MagSol   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ATOMIC LAYER DEPOSITION; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CHEMISORPTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MOLECULES; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; SILICA;

DEPOSITION TECHNIQUE; HEXAMETHYLDISILANES; HIGH SURFACE AREA; PRECURSOR MOLECULES; REACTION MECHANISM; SILICA SURFACE; SOLID-STATE NMR SPECTROSCOPY; SURFACE SPECIES;

SURFACE REACTIONS;

EID: 63049108615     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1066-a05-07     Document Type: Conference Paper

References (4)

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2. Agaskar, P. A., Klemperer, W. G., Inorg. Chim. Acta, 229, 355-364 (1995)
3. Hinchley et al., J. Chem. Soc. Dalton Trans., 2916-2925 (2001)
4. Matero et al., Proceedings of the 213th ECS meeting 2008, Phoenix, USA.