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Journal of Analytical Atomic Spectrometry

Volumn 24, Issue 4, 2009, Pages 391-401

Effect of the silicon chemical form on the emission intensity in inductively coupled plasma atomic emission spectrometry for xylene matrices

(4) Sánchez, Raquel a Todolí, José Luis a Lienemann, Charles Philippe b Mermet, Jean Michel a

a Nutrition and Food Sciences ^* (France)

b IFP ENERGIES NOUVELLES (France)

Author keywords

[No Author keywords available]

Indexed keywords

AROMATIC HYDROCARBONS; ATMOSPHERIC AEROSOLS; ATOMIC EMISSION SPECTROSCOPY; BOILING POINT; INDUCTIVELY COUPLED PLASMA; MANGANESE; MANGANESE COMPOUNDS; ORGANIC COMPOUNDS; PHOTORESISTS; PLASMA DIAGNOSTICS; PNEUMATICS; SILANES; SILICATES; SPECTROMETERS; SPECTROMETRY; ULTRASONICS; XYLENE; ZINC;

CHEMICAL FORMS; CROSS FLOWS; DOUBLE PASS SPRAY CHAMBERS; EMISSION INTENSITIES; HEXAMETHYLDISILOXANE; HIGHER EMISSION INTENSITIES; ICP-AES; IMPACTOR; INDUCTIVELY COUPLED PLASMA-ATOMIC EMISSION SPECTROMETRIES; INTERNAL STANDARDIZATIONS; MEMORY EFFECTS; MG II/MG I; PLASMA CHARACTERISTICS; PRIMARY AEROSOLS; SAMPLE INTRODUCTIONS; SILICON CONCENTRATIONS; SPRAY CHAMBERS; ULTRASONIC NEBULIZERS;

NONMETALS;

EID: 63049102765 PISSN: 02679477 EISSN: 13645544 Source Type: Journal
DOI: 10.1039/b806594m Document Type: Article

Times cited : (36)

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