A multi-technique study of gold oxidation and semiconducting properties of the compact α-oxide layer

Journal of Electroanalytical Chemistry

Volumn 629, Issue 1-2, 2009, Pages 43-49

  Petrović, Ž ^a   Metikos Hukovic M ^a   Babic R ^a   Katic J ^a   Milun, M ^b  

^a UNIVERSITY OF ZAGREB   (Croatia)

^b INSTITUTE OF PHYSICS   (Croatia)

Author keywords

Electrochemical ac dc techniques; Electrooxidation of gold; EQCN; Semiconducting properties; Underpotential deposition (UPD) of OH radicals; XPS

Indexed keywords

CAPACITANCE MEASUREMENT; ELECTROCHEMICAL PROPERTIES; ELECTRONIC STRUCTURE; ELECTROOXIDATION; EMISSION SPECTROSCOPY; FREE RADICALS; GOLD; NUCLEATION; OXIDE FILMS; OXIDE MINERALS; PHASE INTERFACES; QUARTZ; SURFACE STRUCTURE; THREE DIMENSIONAL; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTROCHEMICAL AC/DC TECHNIQUES; EQCN; SEMICONDUCTING PROPERTIES; UNDERPOTENTIAL DEPOSITION (UPD) OF OH RADICALS; XPS;

GOLD DEPOSITS;

EID: 62949228193     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jelechem.2009.01.020     Document Type: Article

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