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Volumn 55-57, Issue , 2008, Pages 469-472
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Characterization of anatase and rutile TiO2 thin films deposited by two cathodes sputtering system
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Author keywords
Anatase; Magnetron sputtering; Rutile; TiO2 films
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Indexed keywords
ANATASE;
CENTER POINTS;
DEPOSITION TIME;
METALLIC TITANIUMS;
RADIAL POSITIONS;
REACTIVE GAS;
RUTILE;
RUTILE TIO;
SI(1 0 0 );
SPUTTERING SYSTEMS;
SPUTTERING TARGETS;
TEM;
TEM IMAGES;
TIO2 FILMS;
TOTAL PRESSURES;
UNHEATED SUBSTRATES;
X-RAY DIFFRACTIONS;
XRD;
ARGON;
CATHODES;
CHEMICAL VAPOR DEPOSITION;
ELECTRODEPOSITION;
ELECTRON TUBES;
INTELLIGENT MATERIALS;
MAGNETRONS;
NANOSTRUCTURED MATERIALS;
OXIDE MINERALS;
OXYGEN;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
SUBSTRATES;
THIN FILMS;
TITANIUM;
TITANIUM DIOXIDE;
TITANIUM OXIDES;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
FUNCTIONAL MATERIALS;
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EID: 62949164654
PISSN: 10226680
EISSN: None
Source Type: Book Series
DOI: None Document Type: Conference Paper |
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Times cited : (7)
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References (10)
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