Chemical vapor deposition and electric characterization of perovskite oxides LaMO3 (M=Co, Fe, Cr and Mn) thin films

Journal of Solid State Chemistry

Volumn 182, Issue 4, 2009, Pages 849-854

  Ngamou, Patrick Herve Tchoua ^a   Bahlawane, Naoufal ^a  

^a BIELEFELD UNIVERSITY   (Germany)

Author keywords

Electrical characterization; Perovskite thin films; Pulsed spray evaporation CVD

Indexed keywords

CARRIER CONCENTRATION; CARRIER MOBILITY; CHEMICAL VAPOR DEPOSITION; CHROMIUM; COBALT; CONTROL SYSTEM ANALYSIS; ELECTRIC PROPERTIES; EVAPORATION; FUNCTIONAL MATERIALS; MANGANESE; MANGANESE COMPOUNDS; OXIDE MINERALS; SEMICONDUCTING SILICON COMPOUNDS; SILICON OXIDES; THIN FILMS; VAPORS;

BAND-GAP ENERGIES; CONCENTRATION OF; CONTROL PARAMETERS; ELECTRIC CHARACTERIZATIONS; ELECTRICAL CHARACTERIZATION; P-TYPE CONDUCTIONS; PEROVSKITE OXIDES; PEROVSKITE STRUCTURES; PEROVSKITE THIN FILMS; PEROVSKITE-TYPE OXIDES; PULSED SPRAY EVAPORATION CVD; SILICON SUBSTRATES; SINGLE PHASE; SYNTHESIS METHODS; TEMPERATURE-DEPENDENT CONDUCTIVITIES; THERMOPOWER;

PEROVSKITE;

EID: 62849107166     PISSN: 00224596     EISSN: 1095726X     Source Type: Journal    
DOI: 10.1016/j.jssc.2008.12.017     Document Type: Article

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