32nm design rule and process exploration flow

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7122, Issue , 2008, Pages

  Zhang, Yunqiang ^a   Cobb, Jonathan ^a   Yang, Amy ^a   Li, Ji ^a   Lucas, Kevin ^a   Sethi, Satyendra ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Design rules; Illumination optimization; OPC; OPC models; RET

Indexed keywords

DESIGN RULES; ILLUMINATION OPTIMIZATION; OPC; OPC MODELS; RET;

ELECTRIC CONDUCTIVITY; LITHOGRAPHY; NANOTECHNOLOGY; OPTIMIZATION; PHOTORESISTORS; PHOTORESISTS; PROCESS CONTROL; PROCESS DESIGN; SEMICONDUCTOR MATERIALS; STRATEGIC PLANNING;

DESIGN;

EID: 62649104139     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.801593     Document Type: Conference Paper

References (3)