Surface cleaning of germanium nanodot ionization substrate for surface-assisted laser desorption/ionization mass spectrometry

Rapid Communications in Mass Spectrometry

Volumn 23, Issue 5, 2009, Pages 603-610

  Sato, Hiroaki ^a   Nemoto, Atsushi ^a   Yamamoto, Atsushi ^a   Tao, Hiroaki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE; DESORPTION; GERMANIUM; MASS SPECTROMETRY; ORGANIC LASERS; SALTS; SILICON WAFERS; SILVER; SOLVENTS; SUBSTRATES;

BACKGROUND SIGNALS; CLEANING METHODS; GERMANIUMS (GE); LASER DESORPTION/IONIZATION MASS SPECTROMETRIES; MATRIX FREE; NANODOTS; ORGANIC CONTAMINANT; PEROXIDE MIXTURE; SILVER SALTS; SURFACE-ASSISTED LASER DESORPTION/IONIZATION;

NANODOTS;

EID: 62549126045     PISSN: 09514198     EISSN: 10970231     Source Type: Journal    
DOI: 10.1002/rcm.3916     Document Type: Article

References (31)

1. Sunner J, Dratz E, Chen YC. Anal. Chem. 1995; 67: 4335.
2. Peterson DS. Mass Spectrom. Rev. 2007; 26: 19.
3. Kinumi T, Saisu T, Takayama M, Niwa H. J. Mass Spectrom. 2000; 35: 417.
4. Chen CT, Chen YC. Anal. Chem. 2004; 76: 1453.
5. Chen CT, Chen YC. Anal. Chem. 2005; 77: 5912.
6. Yuan MJ, Shan Z, Tian BZ, Tu B, Yang PY, Zhao DY. Microporous Mesoporous Mater. 2005; 78: 37.
7. McLean JA, Stumpo KA, Russell DH. J. Am. Chem. Soc. 2005; 127: 5304.
8. Huang YF, Chang HT. Anal. Chem. 2006; 78: 1485.
9. Wen XJ, Dagan S, Wysocki VH. Anal. Chem. 2007; 79: 434.
10. Watanabe T, Kawasaki H, Yonezawa T, Arakawa R. J. Mass Spectrom. 2008; 43: 1063.
11. Kawasaki H, Sugitani T, Watanabe T, Yonezawa T, Moriwaki H, Arakawa R. Anal. Chem. 2008; 80: 7524.
12. Wei J, Buriak JM, Siuzdak G. Nature 1999; 399: 243.
13. Cuiffi JD, Hayes DJ, Fonash SJ, Brown KN, Jones AD. Anal. Chem. 2001; 73: 1292.
14. Finkel NH, Prevo BG, Velev OD, He L. Anal. Chem. 2005; 77: 1088.
15. Go EP, Apon JV, Luo G, Saghatelian A, Daniels RH, Sahi V, Dubrow R, Cravatt BF, Vertes A, Siuzdak G. Anal. Chem. 2005; 77: 1641.
16. Seino T, Sato H, Yamamoto A, Nemoto A, Torimura M, Tao H. Anal. Chem. 2007; 79: 4827.
17. Rashidzadeh H, Guo BC. Chem. Phys. Lett. 1999; 310: 466.
18. Macha SF, Limbach PA, Hanton SD, Owens KG. J. Am. Soc. Mass Spectrom. 2001; 12: 732.
19. Keki S, Szilagyi LS, Torok J, Deak G, Zsuga M. J. Phys. Chem. B 2003; 107: 4818.
20. Keki S, Nagy L, Deak G, Zsuga M, Somogyi L, Levai A. J. Am. Soc. Mass Spectrom. 2004; 15: 879.
21. Choi SS, Ha SH. Bull. Korean Chem. Soc. 2007; 28: 2508.
22. Choi SS, Ha SH, Lee HM, Kim JC. Bull. Korean Chem. Soc. 2007; 28: 1437.
23. Kern W, Puotinen DA. RCA Rev. 1970; 31: 187.
24. Reinhardt KA, Kern W. Handbook of Silicon Wafer Cleaning Technology. Noyes Pubns: Park Ridge, NJ, 2007.
25. Manier ML, Cornett DS, Hachey DL, Caprioli RM. J. Am. Soc. Mass Spectrom. 2008; 19: 666.
26. Verge KM, Agnes GR. J. Am. Soc. Mass Spectrom. 2002; 13: 901.
27. Guo XH, Bruins AP, Covey TR. Rapid Commun. Mass Spectrom. 2006; 20: 3145.
28. Park HM, Kim YM, Cheong CS, Ryu JC, Lee DW, Lee KB. Anal. Sci. 2002; 18: 477.
29. Kang YH, Den W, Bai HL, Ko FH. J. Chromatogr. A 2005; 1070: 137.
30. Morita H, Kim J-S, Ohmi T. Appl. Surf. Sci. 1997; 117/118: 99.
31. Sato H, Seino T, Torimura M, Shimada K, Yamamoto A, Tao H. J. Mass Spectrom. Soc. Jpn. 2005; 53: 247.