Real-time microstructure of shocked LiF crystals: Use of synchrotron x-rays

Journal of Applied Physics

Volumn 105, Issue 5, 2009, Pages

  Turneaure, Stefan J ^a   Gupta, Y M ^a   Zimmerman, K ^a   Perkins, K ^a   Yoo, C S ^a   Shen, G ^b  

^a WASHINGTON STATE UNIVERSITY   (United States)

^b HPCAT and HPSynC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DIFFRACTION GRATINGS; DIFFRACTION PATTERNS; ELASTIC DEFORMATION; ELASTOPLASTICITY; HOLOGRAPHIC INTERFEROMETRY; MAGNESIUM; MAGNESIUM PRINTING PLATES; PLASTIC DEFORMATION; PLASTICS; SEMICONDUCTOR INSULATOR BOUNDARIES; SYNCHROTRONS; X RAYS;

[100] ORIENTATIONS; DIFFRACTION DATUM; DOPED LIF; ELASTIC COMPRESSIONS; ELASTIC PLASTICS; ELASTIC-PLASTIC DEFORMATIONS; IN-SITU; ISOTROPIC LATTICES; LATTICE DISORDERS; LATTICE ORIENTATIONS; LIF CRYSTALS; LOADING HISTORY; LONGITUDINAL STRAINS; MICROSTRUCTURE CHANGES; PEAK STRESS; PLANE ROTATIONS; PLATE IMPACTS; REAL-TIME DATUM; SHOCK COMPRESSIONS; STRUCTURAL CHANGES; SUBNANOSECOND; SYNCHROTRON X-RAYS; THIRD GENERATIONS; X-RAY DIFFRACTION MEASUREMENTS; X-RAY PULSE;

SINGLE CRYSTALS;

EID: 62549086585     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3080176     Document Type: Article

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