Influence of substrate temperature on texture for deposited TiNi films

CIMTEC 2008 - Proceedings of the 3rd International Conference on Smart Materials, Structures and Systems - State-of-the-art Research and Application of SMAs Technologies

Volumn 59, Issue , 2008, Pages 30-34

  Ikenaga, Noriaki ^a   Kishi, Yoichi ^a   Yajima, Zenjiro ^a   Sakudo, Noriyuki ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Ion irradiation; Low temperature crystallization; Multi sputtering; Pole figure; Shape memory alloy

Indexed keywords

INTELLIGENT MATERIALS; ION BOMBARDMENT; MAGNETRONS; METAL IMPLANTS; POLES; SHAPE MEMORY EFFECT; SPUTTERING; SUBSTRATES; TEMPERATURE; X RAY POWDER DIFFRACTION;

LOW-TEMPERATURE CRYSTALLIZATION; POLE FIGURE; POLE FIGURE MEASUREMENTS; SI (001) SUBSTRATE; SPUTTERING PARAMETERS; SPUTTERING SYSTEMS; SUBSTRATE TEMPERATURE; TRANSFORMATION STRAIN;

AMORPHOUS FILMS;

EID: 62449104670     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.4028/www.scientific.net/AST.59.30     Document Type: Conference Paper

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5. K.R.C. Gisser, et al.: Appl. Phys. Lett. 61(14) (1992), p. 1632