Analysis of PVA/AA based photopolymers at the zero spatial frequency limit using interferometric methods

Applied Optics

Volumn 47, Issue 14, 2008, Pages 2557-2563

  Gallego, Sergi ^a   Márquez, Andrés ^a   Méndez, David ^a   Ortuno, Manuel ^a   Neipp, Cristian ^a   Fernández, Elena ^a   Pascual, Inmaculada ^a   Beléndez, Augusto ^a  

^a UNIVERSITY OF ALICANTE   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; INTERFEROMETERS; INTERFEROMETRY; PHOTOPOLYMERS; SWELLING;

INTERFEROMETRIC METHODS; OPTICAL RECORDING MEDIA; RECORDING PROCESS; SPATIAL FREQUENCY; THERMO-MECHANICAL ANALYSIS; THICKNESS VARIATION;

REFRACTIVE INDEX;

EID: 61849114526     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.47.002557     Document Type: Article

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