Submicron patterning on flexible substrates by reduction optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  De Laat, Wim J M ^a   Péter, Mária ^b   Furthner, François ^b   Giesen, Peter T M ^b   Gui, Cheng Qun ^a   Meinders, Erwin R ^b  

^a ASML   (Netherlands)

^b HOLST CENTRE   (Netherlands)

Author keywords

Flexible electronics; Flexible substrates; Optical lithography; Thin film transistor on foil

Indexed keywords

CRITICAL DIMENSION; ELECTRONIC DEVICE; EXPOSURE ENERGY; FLEXIBLE SUBSTRATE; IMAGING TECHNOLOGY; LAMINATION PROCESS; LITHOGRAPHIC PROCESSING; LITHOGRAPHY PROCESS; PROCESS WINDOW; PROJECTION OPTICAL LITHOGRAPHY; SUBMICRON PATTERNING; SUBMICRON PATTERNS; SUBMICRON RANGE; SURFACE FLATNESS;

DIMENSIONAL STABILITY; FLEXIBLE ELECTRONICS; LAMINATING; MANUFACTURE; PHOTOLITHOGRAPHY; TECHNOLOGY; THIN FILM DEVICES; THIN FILM TRANSISTORS;

SUBSTRATES;

EID: 61449153152     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771947     Document Type: Conference Paper

References (5)

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