Magnetic control of polarization and ferroelastic strain switching in Terfenol-D/ Bi12 GeO20 laminate

Applied Physics Letters

Volumn 94, Issue 8, 2009, Pages

  Yang, Pan ^a   Peng, Song ^a   Wang, Xiaofei ^a   Lu, Xiaomei ^a   Yan, Feng ^b   Zhu, Jinsong ^a  

^a NANJING UNIVERSITY   (China)

^b HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITE MICROMECHANICS; MAGNETIC FIELDS; MAGNETOELECTRIC EFFECTS; POLARIZATION;

BI LAYERS; BUTTERFLY LOOPS; EXTERNAL MAGNETIC FIELDS; FERROELASTIC; FERROELASTICITY; MAGNETIC CONTROLS; MAGNETIC FIELD-INDUCED STRAINS; SURFACE STRAINS; TERFENOL-D; TRILAYER;

SHEAR STRAIN;

EID: 61349187572     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3089571     Document Type: Article

References (23)

1. N. Spaldin and M. Fiebig, Science SCIEAS 0036-8075 10.1126/science. 1113357 309, 391 (2005).
2. M. Fiebig, J. Phys. D JPAPBE 0022-3727 10.1088/0022-3727/38/8/R01 38, R123 (2005).
3. W. Eerenstein, N. D. Mathur, and J. F. Scott, Nature (London) NATUAS 0028-0836 10.1038/nature05023 442, 759 (2006).
4. J. F. Scott, Nature Mater. NMAACR 1476-1122 10.1038/nmat1868 6, 256 (2007).
5. J. P. Rivera, Ferroelectrics FEROA8 0015-0193 10.1080/00150199408213357 161, 91 (1994).
6. G. T. Rado, J. M. Ferrari, and W. G. Maisch, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.29.4041 29, 4041 (1984).
7. J. Ryu, S. Priya, K. Uchino, and H. E. Kim, J. Electroceram. JOELFJ 1385-3449 10.1023/A:1020599728432 8, 107 (2002).
8. Y. R. Dai, P. Bao, J. S. Zhu, H. M. Shen, J. M. Liu, and Y. N. Wang, Acta Metall. Sin. 39, 1209 (2003). 1006-7191
9. J. Ryu, A. V. Carazo, K. Uchino, and H. E. Kim, Jpn. J. Appl. Phys., Part 1 JAPNDE 0021-4922 10.1143/JJAP.40.4948 40, 4948 (2001).
10. N. Cai, C. W. Nan, J. Y. Zhai, and Y. H. Lin, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1739277 84, 3516 (2004).
11. J. G. Wan, X. W. Wang, Y. J. Wu, M. Zeng, Y. Wamg, H. Jiang, W. Q. Zho u, G. H. Wang, and J. -M. Liu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1889237 86, 122501 (2005).
12. S. Dong, J. Zhai, J. F. Li, and D. Viehland, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2355459 89, 122903 (2006).
13. G. Srinivasan, E. T. Rasmussen, and R. Hayes, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.67.014418 67, 014418 (2003).
14. G. Srinivasan, E. T. Rasmussen, B. J. Levin, and R. Hayes, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.65.134402 65, 134402 (2002).
15. K. Zhao, K. Chen, Y. R. Dai, J. G. Wan, and J. S. Zhu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2099545 87, 162901 (2005).
16. G. Engdahl, Magnetostrictive Materials Handbook (Academic, New York, 2000).
17. M. I. Bichurin, I. A. Kornev, V. M. Petrov, A. S. Tatarenko, Y. V. Kiliba, and G. Srinivasan, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.64. 094409 64, 094409 (2001).
18. C. W. Nan, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.50.6082 50, 6082 (1994).
19. G. Harse, J. P. Doughety, and R. E. Newnham, Int. J. Appl. Electromagn. Mater. IAMTE7 0925-2096 4, 1541 (1993).
20. P. Yang, K. Zhao, Y. Yin, J. G. Wan, and J. S. Zhu, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.2198486 88, 172903 (2006).
21. P. Yang, S. Peng, X. B. Wu, J. G. Wan, X. M. Lu, F. Yan, and J. S. Zhu, J. Phys. D 42, 015005 (2009). 0022-3727
22. N. Zhang, D. Liang, T. Schneider, and G. Srinivasan, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.2717131 101, 083902 (2007).
23. K. Aizu, Phys. Rev. B PLRBAQ 0556-2805 10.1103/PhysRevB.2.754 2, 754 (1970).