Growth of thin film water on α-Al 2O 3 (0001): An FTIR study

Journal of Physical Chemistry C

Volumn 112, Issue 50, 2008, Pages 20033-20037

  Thomas, Alyssa C ^a   Richardson, Hugh H ^a  

^a OHIO UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM OXIDES; FT-IR SPECTROSCOPIES; FT-IR STUDIES; GROWTH OF THIN FILMS; INFRARED SIGNATURES; INTERFACIAL WATERS; METAL-OXIDE SURFACES; MONOLAYER EQUIVALENTS; MULTI LAYERS; SURFACE CHEMICAL REACTIVITIES; SURFACE-BOUND WATERS; THIN-FILM;

ALUMINA; ALUMINUM; CHEMICAL REACTIVITY; CONTACT ANGLE; FILM GROWTH; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; METALLIC COMPOUNDS; SURFACE STRUCTURE; THIN FILM DEVICES; THIN FILMS;

WATER ABSORPTION;

EID: 61349110712     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp8072766     Document Type: Article

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