Studies of the molecular mechanism of dissolution inhibition of positive photoresist based on novolak-DNQ

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 1262, Issue , 1990, Pages 493-500

  Honda, Kenji ^a   Beauchemin, Bernard T ^a   Hurditch, Rodney J ^a   Blakeney, Andrew J ^a   Kawabe, Yasumasa ^b   Kokubo, Tadayoshi ^b  

^a Microelectronics Research Laboratory ^*  (United States)

^b FUJIFILM CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS;

DEVELOPMENT PROCESS; DIAZONAPHTHOQUINONE; MOLECULAR MECHANISM; NOVOLAK; PHOTOACTIVE COMPOUNDS; SECONDARY DYNAMICS; THEORY OF DISSOLUTION; TWO-STEP MECHANISMS;

DISSOLUTION;

EID: 60849136202     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.20104     Document Type: Conference Paper

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