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Volumn 471, Issue 1-2, 2009, Pages 553-556
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Rapid thermal annealing of chemical bath-deposited CuxS films and their characterization
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Author keywords
Chemical synthesis; Light absorption and reflection; Phase transitions; Photoelectron spectroscopies; Semiconductors
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Indexed keywords
ABSORPTION;
ABSORPTION SPECTROSCOPY;
AMORPHOUS FILMS;
COPPER COMPOUNDS;
CRYSTALS;
ELECTRIC CONDUCTIVITY;
ELECTRODEPOSITION;
ELECTRONS;
LIGHT ABSORPTION;
LIGHT REFLECTION;
PHASE TRANSITIONS;
PHOTOELECTRICITY;
PHOTOELECTRON SPECTROSCOPY;
PHOTOIONIZATION;
PHOTONS;
RAPID THERMAL ANNEALING;
RAPID THERMAL PROCESSING;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR MATERIALS;
SPECTRUM ANALYSIS;
SULFUR;
SYNTHESIS (CHEMICAL);
THIOUREAS;
UREA;
X RAY PHOTOELECTRON SPECTROSCOPY;
CHEMICAL BATHS;
CHEMICAL SYNTHESIS;
COPPER COMPLEXES;
COPPER SULFIDES;
ELEMENTAL MAPPINGS;
HOMOGENEOUS DISTRIBUTIONS;
LIGHT ABSORPTION AND REFLECTION;
OPTICAL TRANSMISSION SPECTRUM;
PHASE TRANSFORMATIONS;
ROOM TEMPERATURES;
SCANNING ELECTRON MICROGRAPHS;
SEMICONDUCTORS;
SILICON SUBSTRATES;
X-RAY PHOTOELECTRON SPECTRUM;
COPPER;
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EID: 60849115285
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2008.04.012 Document Type: Article |
Times cited : (25)
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References (22)
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