High-sensitivity aminoazobenzene chemisorbed monolayers for photoalignment of liquid crystals

Langmuir

Volumn 25, Issue 2, 2009, Pages 997-1003

  Yi, Youngwoo ^a,b   Farrow, Matthew J ^b,c   Korblova, Eva ^b   Walba, David M ^b   Furtak, Thomas E ^a  

^a Department of Geology and Geological Engineering   (United States)

^b UNIVERSITY OF COLORADO   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBED PHOTONS; ABSORPTION CROSS SECTIONS; AMINOAZOBENZENE; ATOMIC FORCES; AZOBENZENE GROUPS; CONTROL BEAMS; HIGH SENSITIVITIES; INTERACTION ENERGIES; LIQUID-CRYSTAL ALIGNMENTS; METHYL REDS; NEMATIC LIQUIDS; ONE-STEP SYNTHESIS; OPTICALLY CONTROLLED; PHOTOALIGNMENT; POLYMER LAYERS; RAPID RESPONSE; SECOND-HARMONIC GENERATIONS; SURFACE COVERAGES; SURFACE NORMALS; TILT ANGLES; TRIETHOXYSILANE; TWISTED STATE;

ABSORPTION; ABSORPTION SPECTROSCOPY; ALIGNMENT; AMINES; ATOMIC SPECTROSCOPY; CHEMISORPTION; CONDENSATION REACTIONS; ELECTRON ENERGY LEVELS; HARMONIC GENERATION; LIGHT SOURCES; LIQUID CRYSTALS; LIQUIDS; MONOLAYERS; NEMATIC LIQUID CRYSTALS; NONLINEAR OPTICS; SILANES; SPECTROSCOPIC ELLIPSOMETRY;

LIQUID CRYSTAL POLYMERS;

4 AMINOAZOBENZENE;

ARTICLE; ARTIFICIAL MEMBRANE; CHEMICAL STRUCTURE; CHEMISTRY; LIQUID CRYSTAL; PARTICLE SIZE; PHOTOCHEMISTRY; SURFACE PROPERTY; SYNTHESIS;

LIQUID CRYSTALS; MEMBRANES, ARTIFICIAL; MOLECULAR STRUCTURE; P-AMINOAZOBENZENE; PARTICLE SIZE; PHOTOCHEMISTRY; SURFACE PROPERTIES;

EID: 60849114433     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la803491g     Document Type: Article

References (32)

1. Ichimura, K.; Suzuki, Y.; Sekl,T.; Aoki, K Langmuir 1988, 4,1214-1216.
2. Gibbons, W. M.; Shannon, P. J.; Sun, S.; Swetlin, B. J. Nature 1991, 351, 49-50.
3. Schadt, M.; Seiberle, H.; Schuster, A. Nature 1996, 381, 212-215.
4. Ichimura, K.; Akiyama, H.; Kudo, K.; Ishizuki, N.; Yamamura, S. Liq. Cryst. 1996, 20, 423-435.
5. Wu, Y. L.; Demachi, Y.; Tsutsumi, O.; Kanazawa, A.; Shiono, T.; Ikeda, T. Macromolecules 1998, 31, 349-354.
6. Ubukata, T.; Seki, T.; Ichimura, K. J. Phys. Chem. B 2000, 104, 4141-4147.
7. Yeung, F. S. Y.; Kwok, H. S. Appl. Phys. Lett. 2003, 83, 4291-4293.
8. Stalder, M.; Schadt, M. Liq. Cryst. 2003, 30, 285-296.
9. Zhong, Z. X.; Li, X. D.; Lee, S. H.; Lee, M. H. Appl. Phys. Lett. 2004, 85, 2520-2523.
10. Furumi, S.; Kidowaki, M.; Ogawa, M.; Nishiura, Y.; Ichimura, K. J. Phys. Chem. B 2005, 109, 9245-9254.
11. Niitsuma, J.; Yoneya, M.; Yokoyama, H. Appl. Phys. Lett. 2008, 92, 241120.
12. Rau, H. In Photoreactive Organic Thin Films; Sekkat, Z., Knoll, W., Eds.; Academic Press: San Diego, 2002; Chapter 1.
13. Todorov, T.; Nikolova, L.; Tomova, N. Appl. Opt. 1984, 23,4309-4312.
14. Anderle, K.; Birenheide, R.; Werner, M. J. A.; Wendorff, J. H. Liq. Cryst. 1991, 9, 691-699.
15. Ignes-Mullol, J.; Claret, J.; Albalat, R.; Crusats, J.; Reigada, R.; Romero, M. T. M.; Sagues, F. Langmuir 2005, 21, 2948-2955.
16. Schönhoff, M.; Mertesdorf, M.; Lösche, M. J. Phys. Chem. 1996, 100, 7558-7565.
17. Corvazier, L.; Zhao, Y. Macromolecules 1999, 32, 3195-3200.
18. Kawanishi, Y.; Tamaki, T.; Sakuragi, M.; Seki, T.; Suzuki, Y.; Ichimura, K. Langmuir 1992, 8, 2601-2604.
19. Aoki, K.; Seki, T.; Suzuki, Y.; Tamaki, T.; Hosoki, A.; Ichimura, K. Langmuir 1992, 8, 1007-1013.
20. Seki, T.; Saguragi, M.; Kawanishi, Y.; Suzuki, Y.; Tamaki, T.; Fukuda, R.; Ichimura, K. Langmuir 1993, 9, 211-218.
21. Ichimura, K.; Hayashi, Y.; Kawanishi, Y.; Seki, T.; Tamaki, T.; Ishizuki, N. Langmuir 1993, 9, 857-860.
22. Li, X.; Kozenkov, V. M.; Yeung, F. S.-Y.; Xu, P.; Chigrinov, V. G.; Kwok, H.-S. Jpn. J. Appl. Phys. 2006, 45, 203-205.
23. Walba, D. M.; Liberko, C. A.; Körblova, E.; Farrow, M.; Furtak, T. E.; Chow, B. C; Schwartz, D. K.; Freeman, A. S.; Douglas, K.; Williams, S. D.; Klittnick, A. F.; Clark, N. A. Liq. Cryst. 2004, 31, 481-489.
24. Barness, Y.; Gershevitz, O.; Sekar, M.; Sukenik, C. N. Langmuir 2000, 16, 247-251.
25. Yi, Y. W.; Furtak, T. E.; Farrow, M. J.; Walba, D. M. J. Vac. Sci. Technol., A 2003, 21, 1770-1775.
26. Yi, Y. W.; Furtak, T. E. Appl. Phys. Lett. 2004, 85, 4287-4288.
27. Vorflusev, V. P.; Kitzerow, H.-S.; Chigrinov, V. G. Appl. Phys. A: Mater. Sci. Process. 1997, 64, 615-618.
28. Karat, P. P.; Madhusudana, M. V. Mol. Cryst. Liq. Cryst. 1977, 40, 239-245.
29. Zhuang, X.; Miranda, P. B.; Kim, D.; Shen, Y. R. Phys. Rev. B 1999, 59, 12632-12640.
30. Ekhoff, J. A.; Farrow, M.; Walba, D.; Rowlen, K. L. Talanta 2003, 60, 801-808.
31. Ghose, K. A.; Crippen, G. M. J. Chem. Inf. Comput. Sci. 1987, 27,21-35.
32. Servant, L.; Dignam, M. J. Thin Solid Films 1994, 242, 21-25.