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Journal of Applied Physics

Volumn 105, Issue 3, 2009, Pages

Resistive switching properties in oxygen-deficient Pr0.7 Ca0.3 MnO3 junctions with active Al top electrodes

(5) Li, Song Lin a Shang, D S a Li, J a Gang, J L a Zheng, D N a

a INSTITUTE OF PHYSICS (China)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; FORMING; HEAT CONDUCTION; HETEROJUNCTIONS; OXYGEN; PLATINUM; SCHOTTKY BARRIER DIODES; SWITCHING; SWITCHING SYSTEMS; TELLURIUM COMPOUNDS;

CONDUCTION MECHANISMS; CONDUCTION PROCESS; CURRENT VOLTAGES; FORMING PROCESS; GIBBS ENERGIES; JUNCTION RESISTANCES; LOW-RESISTANCE STATE; POOLE-FRENKEL EMISSIONS; PR0.7CA0.3MNO3; RESISTANCE VALUES; RESISTIVE SWITCHING; SCHOTTKY BARRIER HEIGHTS; SPACE CHARGE LIMITEDS; SWITCHING THRESHOLDS; SWITCHING VOLTAGES;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 60449104916 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3073987 Document Type: Article

Times cited : (74)

References (33)

1
- 35748974883
- 1476-1122 10.1038/nmat2023.
- R. Waser and M. Aono, Nature Mater. 1476-1122 10.1038/nmat2023 6, 833 (2007).
- (2007) Nature Mater. , vol.6 , pp. 833
- Waser, R.¹ Aono, M.²

2
- 0000748226
- 0003-6951 10.1063/1.126464.
- S. Q. Liu, N. J. Wu, and A. Ignatiev, Appl. Phys. Lett. 0003-6951 10.1063/1.126464 76, 2749 (2000).
- (2000) Appl. Phys. Lett. , vol.76 , pp. 2749
- Liu, S.Q.¹ Wu, N.J.² Ignatiev, A.³

3
- 0001331485
- 0003-6951 10.1063/1.126902.
- A. Beck, J. G. Bednorz, C. Gerber, C. Rossel, and D. Widmer, Appl. Phys. Lett. 0003-6951 10.1063/1.126902 77, 139 (2000).
- (2000) Appl. Phys. Lett. , vol.77 , pp. 139
- Beck, A.¹ Bednorz, J.G.² Gerber, C.³ Rossel, C.⁴ Widmer, D.⁵

4
- 19944434155
- 0003-6951 10.1063/1.1831560.
- S. Seo, M. J. Lee, D. H. Seo, E. J. Jeoung, D. S. Suh, Y. S. Joung, I. K. Yoo, I. R. Hwang, S. H. Kim, I. S. Byun, J. -S. Kim, J. S. Choi, and B. H. Park, Appl. Phys. Lett. 0003-6951 10.1063/1.1831560 85, 5655 (2004).
- (2004) Appl. Phys. Lett. , vol.85 , pp. 5655
- Seo, S.¹ Lee, M.J.² Seo, D.H.³ Jeoung, E.J.⁴ Suh, D.S.⁵ Joung, Y.S.⁶ Yoo, I.K.⁷ Hwang, I.R.⁸ Kim, S.H.⁹ Byun, I.S.¹⁰ Kim, J.-S.¹¹ Choi, J.S.¹² Park, B.H.¹³

5
- 23944447615
- 0021-8979 10.1063/1.2001146.
- B. J. Choi, D. S. Jeong, S. K. Kim, C. Rohde, S. Choi, J. H. Oh, H. J. Kim, C. S. Hwang, K. Szot, R. Waser, B. Reichenberg, and S. Tiedke, J. Appl. Phys. 0021-8979 10.1063/1.2001146 98, 033715 (2005).
- (2005) J. Appl. Phys. , vol.98 , pp. 033715
- Choi, B.J.¹ Jeong, D.S.² Kim, S.K.³ Rohde, C.⁴ Choi, S.⁵ Oh, J.H.⁶ Kim, H.J.⁷ Hwang, C.S.⁸ Szot, K.⁹ Waser, R.¹⁰ Reichenberg, B.¹¹ Tiedke, S.¹²

6
- 33846585095
- 0003-6951 10.1063/1.2436720.
- R. Dong, D. S. Lee, W. F. Xiang, S. J. Oh, D. J. Seong, S. H. Heo, H. J. Choi, M. J. Kwon, S. N. Seo, M. B. Pyun, M. Hasan, and H. S. Hwang, Appl. Phys. Lett. 0003-6951 10.1063/1.2436720 90, 042107 (2007).
- (2007) Appl. Phys. Lett. , vol.90 , pp. 042107
- Dong, R.¹ Lee, D.S.² Xiang, W.F.³ Oh, S.J.⁴ Seong, D.J.⁵ Heo, S.H.⁶ Choi, H.J.⁷ Kwon, M.J.⁸ Seo, S.N.⁹ Pyun, M.B.¹⁰ Hasan, M.¹¹ Hwang, H.S.¹²

7
- 33745386456
- 0163-1829 10.1103/PhysRevB.73.245427.
- D. S. Shang, Q. Wang, L. D. Chen, R. Dong, X. M. Li, and W. Q. Zhang, Phys. Rev. B 0163-1829 10.1103/PhysRevB.73.245427 73, 245427 (2006).
- (2006) Phys. Rev. B , vol.73 , pp. 245427
- Shang, D.S.¹ Wang, Q.² Chen, L.D.³ Dong, R.⁴ Li, X.M.⁵ Zhang, W.Q.⁶

8
- 33846171555
- Q. Wang, D. S. Shang, Z. H. Wu, L. D. Chen, and X. M. Li, Appl. Phys. A: Mater. Sci. Process. 86, 357 (2007).
- (2007) Appl. Phys. A: Mater. Sci. Process. , vol.86 , pp. 357
- Wang, Q.¹ Shang, D.S.² Wu, Z.H.³ Chen, L.D.⁴ Li, X.M.⁵

9
- 44349114419
- 0003-6951 10.1063/1.2932148.
- M. Hasan, R. Dong, H. J. Choi, D. S. Lee, D. -J. Seong, M. B. Pyun, and H. Hwang, Appl. Phys. Lett. 0003-6951 10.1063/1.2932148 92, 202102 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 202102
- Hasan, M.¹ Dong, R.² Choi, H.J.³ Lee, D.S.⁴ Seong, D.-J.⁵ Pyun, M.B.⁶ Hwang, H.⁷

10
- 57049176592
- 1882-0778 10.1143/APEX.1.055002.
- K. Shono, H. Kawano, T. Yokota, and M. Gomi, Appl. Phys. Express 1882-0778 10.1143/APEX.1.055002 1, 055002 (2008).
- (2008) Appl. Phys. Express , vol.1 , pp. 055002
- Shono, K.¹ Kawano, H.² Yokota, T.³ Gomi, M.⁴

11
- 57649099988
- 1882-0778 10.1143/APEX.1.101901.
- H. Kawano, K. Shono, T. Yokota, and M. Gomi, Appl. Phys. Express 1882-0778 10.1143/APEX.1.101901 1, 101901 (2008).
- (2008) Appl. Phys. Express , vol.1 , pp. 101901
- Kawano, H.¹ Shono, K.² Yokota, T.³ Gomi, M.⁴

12
- 44849129646
- 0003-6951 10.1063/1.2938049.
- T. Harada, I. Ohkubo, K. Tsubouchi, H. Kumigashira, T. Ohnishi, M. Lippmaa, Y. Matsumoto, H. Koinuma, and M. Oshima, Appl. Phys. Lett. 0003-6951 10.1063/1.2938049 92, 222113 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 222113
- Harada, T.¹ Ohkubo, I.² Tsubouchi, K.³ Kumigashira, H.⁴ Ohnishi, T.⁵ Lippmaa, M.⁶ Matsumoto, Y.⁷ Koinuma, H.⁸ Oshima, M.⁹

13
- 34547306629
- 0935-9648 10.1002/adma.200601957.
- K. Tsubouchi, I. Ohkubo, H. Kumigashira, M. Oshima, Y. Matsumoto, K. Itaka, T. Ohnishi, M. Lippmaa, and H. Koinuma, Adv. Mater. (Weinheim, Ger.) 0935-9648 10.1002/adma.200601957 19, 1711 (2007).
- (2007) Adv. Mater. (Weinheim, Ger.) , vol.19 , pp. 1711
- Tsubouchi, K.¹ Ohkubo, I.² Kumigashira, H.³ Oshima, M.⁴ Matsumoto, Y.⁵ Itaka, K.⁶ Ohnishi, T.⁷ Lippmaa, M.⁸ Koinuma, H.⁹

14
- 34548656097
- 0935-9648 10.1002/adma.200602915.
- M. Janousch, G. I. Meijer, U. Staub, B. Delley, S. F. Karg, and B. P. Andreasson, Adv. Mater. (Weinheim, Ger.) 0935-9648 10.1002/adma.200602915 19, 2232 (2007).
- (2007) Adv. Mater. (Weinheim, Ger.) , vol.19 , pp. 2232
- Janousch, M.¹ Meijer, G.I.² Staub, U.³ Delley, B.⁴ Karg, S.F.⁵ Andreasson, B.P.⁶

15
- 34147108217
- 0031-9007 10.1103/PhysRevLett.98.146403.
- Y. B. Nian, J. Strozier, N. J. Wu, X. Chen, and A. Ignatiev, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.98.146403 98, 146403 (2007).
- (2007) Phys. Rev. Lett. , vol.98 , pp. 146403
- Nian, Y.B.¹ Strozier, J.² Wu, N.J.³ Chen, X.⁴ Ignatiev, A.⁵

16
- 33645641019
- 1476-1122 10.1038/nmat1614.
- K. Szot, W. Speier, G. Bihlmayer, and R. Waser, Nature Mater. 1476-1122 10.1038/nmat1614 5, 312 (2006).
- (2006) Nature Mater. , vol.5 , pp. 312
- Szot, K.¹ Speier, W.² Bihlmayer, G.³ Waser, R.⁴

17
- 54749098796
- 0022-3727
- S. L. Li, J. L. Gang, J. Li, H. F. Chu, and D. N. Zheng, J. Phys. D: Appl. Phys. 41, 185409 (2008). 0022-3727
- (2008) J. Phys. D: Appl. Phys. , vol.41 , pp. 185409
- Li, S.L.¹ Gang, J.L.² Li, J.³ Chu, H.F.⁴ Zheng, D.N.⁵

18
- 10044237971
- 0003-6951 10.1063/1.1812580.
- A. Sawa, T. Fujii, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett. 0003-6951 10.1063/1.1812580 85, 4073 (2004).
- (2004) Appl. Phys. Lett. , vol.85 , pp. 4073
- Sawa, A.¹ Fujii, T.² Kawasaki, M.³ Tokura, Y.⁴

19
- 33751223552
- 0040-6090 10.1016/j.tsf.2006.03.031.
- C. J. Kim and I. W. Chen, Thin Solid Films 0040-6090 10.1016/j.tsf.2006. 03.031 515, 2726 (2006).
- (2006) Thin Solid Films , vol.515 , pp. 2726
- Kim, C.J.¹ Chen, I.W.²

20
- 32044473095
- 0021-4922 10.1143/JJAP.44.L1241.
- A. Sawa, T. Fujii, M. Kawasaki, and Y. Tokura, Jpn. J. Appl. Phys., Part 2 0021-4922 10.1143/JJAP.44.L1241 44, L1241 (2005).
- (2005) Jpn. J. Appl. Phys., Part 2 , vol.44 , pp. 1241
- Sawa, A.¹ Fujii, T.² Kawasaki, M.³ Tokura, Y.⁴

21
- 33751079841
- 0021-8979 10.1063/1.2361087.
- W. C. Peng, J. G. Lin, and J. H. Wu, J. Appl. Phys. 0021-8979 10.1063/1.2361087 100, 093704 (2006).
- (2006) J. Appl. Phys. , vol.100 , pp. 093704
- Peng, W.C.¹ Lin, J.G.² Wu, J.H.³

22
- 3142563213
- 0021-8979 10.1063/1.1737802.
- D. W. Reagor, S. Y. Lee, Y. Li, and Q. X. Jia, J. Appl. Phys. 0021-8979 10.1063/1.1737802 95, 7971 (2004).
- (2004) J. Appl. Phys. , vol.95 , pp. 7971
- Reagor, D.W.¹ Lee, S.Y.² Li, Y.³ Jia, Q.X.⁴

23
- 33847325396
- 0304-8853 10.1016/j.jmmm.2006.10.346.
- H. Wadati, A. Maniwa, I. Ohkubo, H. Kumigashira, A. Fujimori, M. Oshima, M. Lippmaa, M. Kawasaki, and H. Koinuma, J. Magn. Magn. Mater. 0304-8853 10.1016/j.jmmm.2006.10.346 310, 963 (2007).
- (2007) J. Magn. Magn. Mater. , vol.310 , pp. 963
- Wadati, H.¹ Maniwa, A.² Ohkubo, I.³ Kumigashira, H.⁴ Fujimori, A.⁵ Oshima, M.⁶ Lippmaa, M.⁷ Kawasaki, M.⁸ Koinuma, H.⁹

24
- 0017906209
- 0018-8646
- H. Michaelson, IBM J. Res. Dev. 22, 72 (1978). 0018-8646
- (1978) IBM J. Res. Dev. , vol.22 , pp. 72
- Michaelson, H.¹

25
- 0004177869
- (Plenum, New York).
- C. N. Turton and T. I. Turton, The Oxide Handbook (Plenum, New York, 1973).
- (1973) The Oxide Handbook
- Turton, C.N.¹ Turton, T.I.²

26
- 49149097171
- 0003-6951 10.1063/1.2967194.
- C. B. Lee, B. S. Kang, A. Benayad, M. J. Lee, S. -E. Ahn, K. H. Kim, G. Stefanovich, Y. Park, and I. K. Yoo, Appl. Phys. Lett. 0003-6951 10.1063/1.2967194 93, 042115 (2008).
- (2008) Appl. Phys. Lett. , vol.93 , pp. 042115
- Lee, C.B.¹ Kang, B.S.² Benayad, A.³ Lee, M.J.⁴ Ahn, S.-E.⁵ Kim, K.H.⁶ Stefanovich, G.⁷ Park, Y.⁸ Yoo, I.K.⁹

27
- 0000124850
- 0021-9606 10.1063/1.440654.
- S. Shirasaki, H. Yamamura, H. Haneda, K. Kakegawa, and J. Moori, J. Chem. Phys. 0021-9606 10.1063/1.440654 73, 4640 (1980).
- (1980) J. Chem. Phys. , vol.73 , pp. 4640
- Shirasaki, S.¹ Yamamura, H.² Haneda, H.³ Kakegawa, K.⁴ Moori, J.⁵

28
- 0004005306
- 3rd ed. (Wiley, New Jersey).
- S. M. Sze and K. K. Ng, Physics of Semiconductor Devices, 3rd ed. (Wiley, New Jersey, 2007).
- (2007) Physics of Semiconductor Devices
- Sze, S.M.¹ Ng, K.K.²

29
- 33646673155
- 0003-6951 10.1063/1.2193328.
- M. Hamaguchi, K. Aoyama, S. Asanuma, Y. Uesu, and T. Katsufuji, Appl. Phys. Lett. 0003-6951 10.1063/1.2193328 88, 142508 (2006).
- (2006) Appl. Phys. Lett. , vol.88 , pp. 142508
- Hamaguchi, M.¹ Aoyama, K.² Asanuma, S.³ Uesu, Y.⁴ Katsufuji, T.⁵

30
- 44849128158
- 0003-6951 10.1063/1.2939555.
- S. Kim and Y. -K. Choi, Appl. Phys. Lett. 0003-6951 10.1063/1.2939555 92, 223508 (2008).
- (2008) Appl. Phys. Lett. , vol.92 , pp. 223508
- Kim, S.¹ Choi, Y.-K.²

31
- 0003194163
- 0163-1829 10.1103/PhysRevB.64.153407.
- O. Kurnosikov, F. C. de Nooij, P. LeClair, J. T. Kohlhepp, B. Koopmans, H. J. M. Swagten, and W. J. M. de Jonge, Phys. Rev. B 0163-1829 10.1103/PhysRevB.64.153407 64, 153407 (2001).
- (2001) Phys. Rev. B , vol.64 , pp. 153407
- Kurnosikov, O.¹ De Nooij, F.C.² Leclair, P.³ Kohlhepp, J.T.⁴ Koopmans, B.⁵ Swagten, H.J.M.⁶ De Jonge, W.J.M.⁷

32
- 34547513244
- 0013-4651 10.1149/1.2750450.
- C. Y. Lin, C. Y. Wu, C. Y. Wu, C. Hu, and T. Y. Tsenga, J. Electrochem. Soc. 0013-4651 10.1149/1.2750450 154, G189 (2007).
- (2007) J. Electrochem. Soc. , vol.154 , pp. 189
- Lin, C.Y.¹ Wu, C.Y.² Wu, C.Y.³ Hu, C.⁴ Tsenga, T.Y.⁵

33
- 41749085966
- 0741-3106
- L. -E. Yu, S. Kim, M. -K. Ryu, S. -Y. Choi, and Y. -K. Choi, IEEE Electron Device Lett. 29, 331 (2008). 0741-3106
- (2008) IEEE Electron Device Lett. , vol.29 , pp. 331
- Yu, L.-E.¹ Kim, S.² Ryu, M.-K.³ Choi, S.-Y.⁴ Choi, Y.-K.⁵

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