Reactive ion etching of sol-gel derived PZT thin film and Pt/Ti bottom electrode for FRAM

Ferroelectrics

Volumn 232, Issue 1-4, 1999, Pages 47-52

  Tang, Ting Ao ^a   Chen, Zheng ^a   Li, Ning ^a   Zou, Si Xun ^a  

^a FUDAN UNIVERSITY   (China)

Author keywords

Ferroelectric capacitors; PZT; RIE

Indexed keywords

EID: 6044242346     PISSN: 00150193     EISSN: None     Source Type: Journal    
DOI: 10.1080/00150199908015769     Document Type: Article

References (8)

1. James, F. Scott and Carlos A. Paz de Araujo, Science, Vol. 246, 1400
2. Carlos A. Paz de Araujo, Larry D. McMillan, Bradley M. Melnick, Joseph D. Cuchiaro and James F. Scott, Ferroelectrics, Vol. 102,256 (1990)
3. M.R. Poor and C.B. Fleddermann, J. Appl. Phys., 70, 3385(1991)
4. K. Satio, J.H. Choi, T. Fukuda and M. Ohue, Jpn. J. Appl. Phys., 31,1260 (1992)
5. Dilip P. Vijay, Seshu B. Desu and Wei Pan, Ferroelectric Thin Films III Symp., 133, (1993)
6. J.J. Van Glabbeek, G.A.C.M. Spierings, M.J.E. Ulenaers, G.J.M. Dormans and P.K. Larsen, Ferroelectric Thin Films III Symp., 127, (1993)
7. B.M. Melnick, J.D. Cuchiaro, L.D. McMillian, C.A. Paz de Araujo, and J.F. Scott, Ferroelectrics, Vol. 112,329 (1990)
8. B.M. Melnick, C.A. Paz de Araujo, L.D. McMillian, D.A. Carver, and J.F. Scott, Ferroelectrics, Vol. 116, 79 (1991)