Emissivity compensated radiation thermometry of silicon wafers during the growth of oxide films

Jiliang Xuebao/Acta Metrologica Sinica

Volumn 29, Issue 6, 2008, Pages 134-139

  Iuchi, Tohru ^a   Gogami, Atsushi ^a  

^a TOYO UNIVERSITY   (Japan)

Author keywords

Emissivity; Hybrid type surface temperature sensor; Metrology; Polarization; Radiation thermometry; Silicon wafer

Indexed keywords

EID: 60149108681     PISSN: 10001158     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (15)