Tuning and transcription of the supramolecular organization of a fluorescent silsesquioxane precursor into silica-based materials through direct photochemical hydrolysis-polycondensation and micropatterning

Advanced Functional Materials

Volumn 19, Issue 3, 2009, Pages 404-410

  Sallenave, Xavier ^a   Dautel, Olivier J ^a   Wantz, Guillaume ^b   Valvin, Pierre ^c   Lère Porte, Jean Pierre ^a   Moreau, Joel J E ^a  

^a INSTITUT CHARLES GERHARDT   (France)

^b Ecole Nationale Superieure de Chimie et de Physique de Bordeaux   (France)

^c UNIVERSITÉ MONTPELLIER 2   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFICATION; CHROMOPHORES; COLLOIDS; COMPOSITE FILMS; COPPER; ELECTRIC EQUIPMENT PROTECTION; FLUORESCENCE; GELATION; HYDROLYSIS; OPTICAL PROPERTIES; OPTICAL SYSTEMS; PHASE SEPARATION; PHOTORESISTORS; PHOTORESISTS; PIXELS; POLYCONDENSATION; POLYMERIZATION; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON WAFERS; TRANSCRIPTION;

AGGREGATED STRUCTURES; AGGREGATION PROPERTIES; CHEMICAL AMPLIFICATIONS; CYCLOHEXYL; FLUORESCENT MATERIALS; HOMOGENEOUS LAYERS; MESH GRIDS; MICRO-PATTERNING; PHOTO ACID GENERATORS; PHOTOPATTERNED; RECTANGULAR HOLES; SHADOW MASKS; SILSEQUIOXANE; SILSESQUIOXANE; SOL-GEL PRECURSORS; SUPRAMOLECULAR ORGANIZATIONS; TEM; UV EXPOSURES; UV PROTECTIONS;

AGGLOMERATION;

EID: 60149098756     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.200801387     Document Type: Article

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