A study of the CMP effect on the quality of thin silicon films crystallized by using the μ-Czochralski process

Journal of the Korean Physical Society

Volumn 54, Issue 1 PART 2, 2009, Pages 432-436

  Derakhshandeh, J ^a   Tajari Mofrad, M R ^a   Ishihara, R ^a   Van Der Cingel, J ^a   Beenakker, C I M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

CMP; Excimer laser crystallization; Single grain TFTs; Czochralski

Indexed keywords

EID: 60049086097     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.54.432     Document Type: Conference Paper

References (3)

1. P. B. Zantye, A. Kumar and A. K. Sikder, Materials Science and Engineering R 45 (2004).
2. Y. Hiroshima, D. Abe, S. Inoue, T. Shimoda, J. W. Metselaar, V. Rana, R. Ishihara and C. I. M. Beenakker. IEEE Transactions on Electron Devices 2622 (2005).
3. R. Vikas, R. Ishihara, Y. Hiroshima, D. Abe, S. Inoue, T. Shimoda, J. W. Metselaar and C. I. M. Beenakker, IEDM 2005.