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Volumn 37, Issue 12, 2008, Pages 2186-2190
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Effects of deposition parameters on structures of sputtered Ti films and TiO2 nanotube arrays prepared by anodic oxidation
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Author keywords
Anodic oxidation; RF magnetron sputtering; Ti thin films; TiO2 nanotube arrays
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Indexed keywords
GRAIN BOUNDARIES;
HEATING;
HYDROFLUORIC ACID;
MAGNETRON SPUTTERING;
MAGNETRONS;
MOS CAPACITORS;
NANOTUBES;
OXIDATION;
SUBSTRATES;
THIN FILMS;
TITANIUM;
TITANIUM DIOXIDE;
TITANIUM OXIDES;
ANODIZING VOLTAGES;
CONSTANT POTENTIALS;
CRYSTALLINITY;
DEPOSITION PARAMETERS;
GLASS SUBSTRATES;
GRAIN ORIENTATIONS;
HEXAGONAL CRYSTALS;
HF SOLUTIONS;
HIGHER TEMPERATURES;
RF MAGNETRON SPUTTERING;
ROOM TEMPERATURES;
SPUTTERING POWER;
SPUTTERING PRESSURES;
SPUTTERING TIME;
SUBSTRATE HEATING;
THICKNESS OF THE FILMS;
TI FILMS;
TI THIN FILMS;
TIO2 NANOTUBE ARRAYS;
TITANIA NANOTUBES;
ANODIC OXIDATION;
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EID: 59549086774
PISSN: 1002185X
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (5)
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References (10)
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