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Volumn 37, Issue 12, 2008, Pages 2186-2190

Effects of deposition parameters on structures of sputtered Ti films and TiO2 nanotube arrays prepared by anodic oxidation

Author keywords

Anodic oxidation; RF magnetron sputtering; Ti thin films; TiO2 nanotube arrays

Indexed keywords

GRAIN BOUNDARIES; HEATING; HYDROFLUORIC ACID; MAGNETRON SPUTTERING; MAGNETRONS; MOS CAPACITORS; NANOTUBES; OXIDATION; SUBSTRATES; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

EID: 59549086774     PISSN: 1002185X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (5)

References (10)
  • 5
    • 36549100396 scopus 로고
    • Müller K H. Appl Phys[J], 1986, 59(8): 2803
    • (1986) Appl Phys , vol.59 , Issue.8 , pp. 2803
    • Müller, K.H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.