Electron accepting abilities of arylborane derivatives: Effect of fluorine substituents

Chemical Physics

Volumn 356, Issue 1-3, 2009, Pages 171-176

  Peng, Bin ^a   Li, Qian Shu ^a,b   Xie, Yaoming ^c   Bruce King, R ^a,c   III, Henry F Schaefer ^c  

^a SOUTH CHINA NORMAL UNIVERSITY   (China)

^b BEIJING INSTITUTE OF TECHNOLOGY   (China)

^c UNIVERSITY OF GEORGIA   (United States)

Author keywords

Arylboranes; Boron; Electron affinity; Fluorine

Indexed keywords

EID: 59349107487     PISSN: 03010104     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.chemphys.2008.10.050     Document Type: Article

References (32)

1. Krause E., and Nitsche R. Ber. Deutsch. Chem. Ges. 55B (1922) 1261
2. Bent H.E., and Dorfman M. J. Am. Chem. Soc. 87 (1935) 1259
3. Massey A.G., Park A.J., and Stone F.G.A. Proc. Chem. Soc. (1963) 212
4. Yang X., Stern C.L., and Marks T.J. J. Am. Chem. Soc. 116 (1994) 10015
5. Yang X., Stern C.L., and Marks T.J. J. Am. Chem. Soc. 113 (1991) 3623
6. J.A. Ewen, M.J. Elder, J. Eur. Patent Appl. 0, 427,697, 1991; US Pat. 5,561,092, 1996.
7. Piers W.E., and Chivers T. Chem. Soc. Rev. 26 (1997) 345
8. Piers W.E. Adv. Organomet. Chem. 52 (2005) 1
9. Yuan Z., Entwistle C.D., Collings J.C., Albesa-Jové D., Batsanov A.S., Howard J.A.K., Taylor N.J., Kaiser H.M., Kaufmann D.E., Poon S.Y., Wong W.Y., Jardin C., Fathallah S., Boucekkine A., Halet J.F., and Marder T.B. Chem. Eur. J. 12 (2006) 2758
10. Entwistle C.D., and Marder T.B. Angew. Chem., Int. Ed. 41 (2002) 2927
11. Noda T., and Shirota Y. J. Am. Chem. Soc. 120 (1998) 9714
12. Shirota Y. J. Mater. Chem. 15 (2005) 75
13. Jia W.L., Bai D.R., McCormick T., Liu Q.D., Motala M., Wang R., Seward C., Tao Y., and Wang S. Chem. Eur. J. 10 (2004) 994
14. Chiu C.W., and Gabbai F.P. J. Am. Chem. Soc. 128 (2006) 14248
15. Hudnall T.W., Melaimi M., and Gabbai F.P. Org. Lett. 8 (2006) 2747
16. Lee M.H., Agou T., Kobayashi J., Kawashima T., and Gabbai F.P. Chem. Commun. (2007) 1133
17. Yamaguchi S., Akiyama S., and Tamao K. J. Am. Chem. Soc. 123 (2001) 11372
18. Liu X.Y., Bai D.R., and Wang S. Angew. Chem., Int. Ed. 45 (2006) 5475
19. Jäkle F. Coord. Chem. Rev. 250 (2006) 1107
20. Sun Y., Ross N., Zhao S.-B., Huszarik K., Jia W.-L., Wang R.-Y., Macartney D., and Wang S. J. Am. Chem. Soc. 129 (2007) 7510
21. Becke A.D. J. Chem. Phys. 98 (1993) 5648
22. Lee C., Yang W., and Parr R.G. Phys. Rev. B 37 (1988) 785
23. Becke A.D. Phys. Rev. A 38 (1988) 3098
24. Perdew J.P. Phys. Rev. B 33 (1986) 8822
25. Kutzelnigg W. Lect. Notes Comput. Sci. 6 (2006) 23
26. Dunning T.H. J. Chem. Phys. 3 (1970) 823
27. Huzinaga S. J. Chem. Phys. 2 (1965) 293
28. M.J. Frisch et al., Gaussian 03, Revision C 02; Gaussian, Inc.; Wallingford CT, 2004 (see Supplementary material for details).
29. M.J. Frisch et al., Gaussian 94, Revision C.3; Gaussian, Inc.: Pittsburgh, PA, 1995 (see Supplementary material for details).
30. Kawaguchi K. J. Chem. Phys. 96 (1992) 3411
31. Zettler F., Hausen H.D., and Hess H. J. Organomet. Chem. 72 (1974) 157
32. Mitu S., and Baird M.C. Organometallics 25 (2006) 4888