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Volumn 332, Issue 1, 2009, Pages 32-38
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Fabrication and characterization of positive and negative copper sulfide micropatterns on self-assembled monolayers
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Author keywords
Copper sulfide; Micropattern; Optical property; Self assembly monolayer
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Indexed keywords
CHEMICAL BATH DEPOSITION METHODS;
COPPER SULFIDE;
CRYSTAL FILMS;
LOW BAND GAPS;
MICRO-PATTERNED;
MICROPATTERN;
NEAR INFRA-RED REGIONS;
OPTICAL PROPERTY;
OPTICAL TRANSMISSIONS;
SELF-ASSEMBLY MONOLAYER;
SEM;
SI SUBSTRATES;
SINGLE BONDS;
UV-VIS SPECTRUMS;
VISIBLE LIGHT REGIONS;
XPS;
XRD SPECTRUM;
COPPER;
ELECTRODEPOSITION;
ELECTRON ENERGY LEVELS;
INFRARED DEVICES;
LIGHT;
MONOLAYERS;
OPTICAL PROPERTIES;
SELF ASSEMBLED MONOLAYERS;
SELF ASSEMBLY;
SEMICONDUCTING SILICON COMPOUNDS;
SILANES;
SPECTRUM ANALYZERS;
THIN FILMS;
OPTICAL FILMS;
COPPER SULFIDE;
SELF ASSEMBLED MONOLAYER;
SILANE;
SULFIDE;
UNCLASSIFIED DRUG;
ABSORPTION;
ARTICLE;
CHEMICAL STRUCTURE;
PRIORITY JOURNAL;
SCANNING ELECTRON MICROSCOPY;
ULTRAVIOLET SPECTROSCOPY;
X RAY DIFFRACTION;
X RAY PHOTOELECTRON SPECTROSCOPY;
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EID: 59049098380
PISSN: 00219797
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcis.2008.11.066 Document Type: Article |
Times cited : (15)
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References (33)
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