Dual-cathode method for sputtering magnetoelastic iron-boron films

Vacuum

Volumn 83, Issue 6, 2009, Pages 958-964

  Johnson, Michael L ^a   LeVar, Odum ^a   Yoon, Sang H ^a   Park, Jung Hyun ^a   Huang, Shichu ^a   Kim, Dong Joo ^a   Cheng, Zhongyang ^a   Chin, Bryan A ^a  

^a AUBURN UNIVERSITY   (United States)

Author keywords

Boron; Iron; Magnetoelastic; Magnetostrictive; Sensor; Sputtering

Indexed keywords

BORON; BORON COMPOUNDS; CHEMICAL ANALYSIS; ELECTRIC NETWORK ANALYSIS; GOLD DEPOSITS; IRON COMPOUNDS; MAGNETIC FIELD EFFECTS; MAGNETOSTRICTION; MAGNETOSTRICTIVE DEVICES; RESONANCE; SENSOR NETWORKS; SENSORS; WIRELESS NETWORKS;

IRON; MAGNETOELASTIC; MAGNETOSTRICTIVE; SENSOR; SPUTTERING;

WIRELESS SENSOR NETWORKS;

EID: 58749115026     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.11.004     Document Type: Article

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