Nucleation, growth, and morphological properties of electrodeposited nickel films from different baths

Surface Review and Letters

Volumn 15, Issue 6, 2008, Pages 717-725

  Sahari, A ^a,b   Azizi, A ^a   Schmerber, G ^b   Dinia, A ^b  

^a FERHAT ABBAS UNIVERSITY   (Algeria)

^b INSTITUT DE PHYSIQUE ET CHIMIE DES MATÉRIAUX DE STRASBOURG   (France)

Author keywords

Atomic force microscopy; Deposition; Diffusion; Growth

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHLORINE COMPOUNDS; DEPOSITION; DIFFUSION; ELECTRODEPOSITION; GROWTH (MATERIALS); NICKEL; NUCLEATION; SULFUR COMPOUNDS;

CHLORIDE SOLUTIONS; ELECTROCHEMICAL TECHNIQUES; ELECTRODEPOSITED NICKEL FILM; HYDROGEN EVOLUTION REACTIONS; INHIBITION PROCESS; MORPHOLOGICAL PROPERTIES; NICKEL ELECTRODEPOSITION; THEORETICAL MODELING;

ELECTRODES;

EID: 58449111510     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X08012165     Document Type: Article

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