|
|
Volumn 40, Issue 13, 2008, Pages 1631-1634
|
|
XPS-depth analysis using C60 ion sputtering of buried interface in plasma-treated ethylene-tetrafluoroethylene-copolymer (ETFE) film
a
|
|
Author keywords
Adhesion; Buried interface; C60 ion beam; ETFE; XPS
|
|
Indexed keywords
ADHESION;
ARGON;
BEAM PLASMA INTERACTIONS;
CARBON CLUSTERS;
COPOLYMERIZATION;
ELECTRIC DISCHARGES;
ETHYLENE;
FULLERENES;
HYDROCARBONS;
HYDROPHILICITY;
INERT GASES;
ION BEAMS;
ION BOMBARDMENT;
OXYGEN;
PLASMAS;
POLYMERS;
SPUTTERING;
SURFACE TREATMENT;
X RAY PHOTOELECTRON SPECTROSCOPY;
ADHESION LAYERS;
ARGON ION BEAMS;
BURIED INTERFACE;
C60 ION BEAM;
DEPTH ANALYSIS;
DEPTH PROFILING;
DEPTH RESOLUTION;
ETFE;
FILM SURFACES;
ION SPUTTERING;
PEAK ANALYSIS;
PLASMA CONDITIONS;
PLASMA DISCHARGES;
TETRAFLUOROETHYLENE (EPTFE);
XPS;
XPS ANALYSIS;
IONS;
|
|
EID: 58449108094
PISSN: 01422421
EISSN: 10969918
Source Type: Journal
DOI: 10.1002/sia.2884 Document Type: Article |
|
Times cited : (8)
|
|
References (6)
|
