Cure depth control for complex 3D microstructure fabrication in dynamic mask projection microstereolithography

Rapid Prototyping Journal

Volumn 15, Issue 1, 2009, Pages 59-70

  Choi, Jae Won ^a   Wicker, Ryan B ^a   Cho, Seok Hyun ^b   Ha, Chang Sik ^b   Lee, Seok Hee ^b  

^a University of Texas at El Paso   (United States)

^b Pusan National University   (South Korea)

Author keywords

Manufacturing systems; Optical properties of materials; Rapid prototypes

Indexed keywords

ABSORPTION; CURING; ELECTROMAGNETIC WAVE ABSORPTION; ENERGY ABSORPTION; FABRICATION; FACINGS; LIGHT ABSORPTION; LIGHT MEASUREMENT; LIGHT SOURCES; LIGHTING; MANUFACTURE; MATERIALS PROPERTIES; METALLOGRAPHIC MICROSTRUCTURE; MICROSTRUCTURE; OPTICAL PROPERTIES; RESINS; THREE DIMENSIONAL; ULTRAVIOLET RADIATION;

3D MICRO STRUCTURES; AB SORPTION CHARACTERISTICS; DEPTH CONTROL; DESIGN/METHODOLOGY/APPROACH; EXPOSURE ENERGY; LIGHT ABSORBERS; LIGHT WAVELENGTHS; MANUFACTURING SYSTEMS; MASK PROJECTION; MECHANICAL STRENGTHS; MICROSTRUCTURE FABRICATIONS; OPTICAL PROPERTIES OF MATERIALS; PENETRATION DEPTHS; RAPID PROTOTYPES; ULTRAVIOLET (UV) LIGHT;

LIGHT;

EID: 58449090340     PISSN: 13552546     EISSN: None     Source Type: Journal    
DOI: 10.1108/13552540910925072     Document Type: Article

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