Post-etch cleaning after dry etching the emitter windows to improve the bipolar characteristics in a 0.5μm BiCMOS process

European Solid-State Device Research Conference

Volumn , Issue , 1994, Pages 137-140

  Decoutere, S ^a   Vanhaelemeersch, S ^a   Deferm, L ^a   Vleugels, F ^a   Vancuyck, G ^a  

^a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

BI-CMOS PROCESS; BIPOLAR CHARACTERISTICS; POST-ETCH CLEANING;

EID: 5844359603     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)