Chemical kinetics of the removal of formaldehyde in dielectric barrier discharges

Wuli Huaxue Xuebao/ Acta Physico - Chimica Sinica

Volumn 23, Issue 9, 2007, Pages 1425-1431

  Zhang Jing, Z ^a   Lü, Fu Gong ^a   Xu Yong, X ^a   Yang, Xue Feng ^a   Zhu, Ai Min ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Chemical kinetics; Dielectric barrier discharge; HCHO; Modeling

Indexed keywords

EID: 58349084058     PISSN: 10006818     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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